Physics Commons^™

Analysis Of Adsorbed Contaminants Of Caf/Sub 2/ Surfaces By Infrared Laser Induced Desorption, Jinmei Fu, Yamini Surapaneni, Susan D. Allen

Mechanical Engineering - Daytona Beach

157 nm photolithography technologies are currently under development and have been accepted as the leading candidate for fabrication of the next generation semiconductor devices after 193 nm. At this and shorter wavelengths, molecular contamination of surfaces becomes a serious problem as almost all molecules absorb at 157 nm and below. The light transmitted by a photolithographic tool can be significantly decreased by the presence of a few monolayers adsorbed on its many optical surfaces. We have developed a laser induced desorption, electron impact ionization, time-of-flight mass spectrometer (LID TOFMS) to study contaminants on 157nm and other ultraviolet optics, e.g., polished …

Optical Transmission Measurements Of Explosive Boiling And Liftoff Of A Layer Of Micron-Scale Water Droplets From A Krf Laser-Heated Si Substrate, Sergey I. Kudryashov, Susan D. Allen

Mechanical Engineering - Daytona Beach

Water plume velocities were measured in air by optical transmission as a function of laser fluence using a KrF laser for explosive boiling and liftoff of a layer of micron-scale waterdroplets from a laser-heated Si substrate of interest for laser particle removal. The thickness of the superheated water layer near the water/Si interface determines acceleration and removal of the waterdroplets from the Si substrate.

© 2003 American Institute of Physics