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Raman Spectroscopic Study Of The Formation Of T-Mosi2 From Mo/Si Multilayers, Ming Cai, David D. Allred, A. Reyes-Mena
Raman Spectroscopic Study Of The Formation Of T-Mosi2 From Mo/Si Multilayers, Ming Cai, David D. Allred, A. Reyes-Mena
Faculty Publications
We have used Raman spectroscopy, large- and small-angle x-ray diffraction spectroscopy of sputter-deposited, vacuum-annealed, soft x-ray Mo/Si thin-film multilayers to study the physics of silicide formation. Two sets of multilayer samples with d-spacing 8.4 and 2.0 nm have been studied. Annealing at temperatures above 800 °C causes a gradual formation of amorphous MoSi2 interfaces between the Si and Mo layers. The transition from amorphous to crystalline MoSi2 is abrupt. The experimental results indicate that nucleation is the dominant process for the early stage and crystallization is the dominant process after nucleation is well advanced. In the thicker multilayer, a portion …
Comparison Of Effective Medium Procedures For Optical Modeling Of Laminar Structures, David D. Allred, Robert F. Edgerton
Comparison Of Effective Medium Procedures For Optical Modeling Of Laminar Structures, David D. Allred, Robert F. Edgerton
Faculty Publications
This study addresses the question, "How can the optical properties of matter in ultrathin amorphous nonmetallic films in multilayers best be determined from reflectance (R) and transmission (T) measurements?" A blue shift in the band gap of plasma CVD a-Si:H/a-SiNx:H multilayers was reported several years ago. It was suggested that the shift in the band gap, Eg, Relative to bulk a-Si:H as given by the Tauç plot was due to quantum confinement effects. The purpose of this study is to evaluate the usefulness of various effective media theories (EMT) for determining the optical constants of materials in a multilayer and …