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Full-Text Articles in Physics
Raman Spectroscopic Study Of The Formation Of T-Mosi2 From Mo/Si Multilayers, Ming Cai, David D. Allred, A. Reyes-Mena
Raman Spectroscopic Study Of The Formation Of T-Mosi2 From Mo/Si Multilayers, Ming Cai, David D. Allred, A. Reyes-Mena
Faculty Publications
We have used Raman spectroscopy, large- and small-angle x-ray diffraction spectroscopy of sputter-deposited, vacuum-annealed, soft x-ray Mo/Si thin-film multilayers to study the physics of silicide formation. Two sets of multilayer samples with d-spacing 8.4 and 2.0 nm have been studied. Annealing at temperatures above 800 °C causes a gradual formation of amorphous MoSi2 interfaces between the Si and Mo layers. The transition from amorphous to crystalline MoSi2 is abrupt. The experimental results indicate that nucleation is the dominant process for the early stage and crystallization is the dominant process after nucleation is well advanced. In the thicker multilayer, a portion …
Use Of Raman Spectroscopy In Characterizing Soft X-Ray Multilayers: Tools In Understanding Structure And Interfaces, Ming Cai, Qi Wang, David D. Allred, Larry V. Knight, Dorian M. Hatch, A. Reyes-Mena, Guizhong Zhang
Use Of Raman Spectroscopy In Characterizing Soft X-Ray Multilayers: Tools In Understanding Structure And Interfaces, Ming Cai, Qi Wang, David D. Allred, Larry V. Knight, Dorian M. Hatch, A. Reyes-Mena, Guizhong Zhang
Faculty Publications
Our group is studying the structure and interfaces of soft x-ray multilayers by various techniques including x-ray diffraction and Raman spectroscopy. Raman spectroscopy is particularly useful since it is sensitive to the identity of individual bonds and thus can potentially characterize the abruptness of interfaces in multilayers. Blocking interfacial mixing is very important in achieving and maintaining high reflectivity. We report our studies of the as-deposited and postannealed structure of Mo/Si and W/C multilayers. The Mo/Si system is probably the most widely studied multilayer currently because of its potential applications for soft x-ray projection lithography for the range of 13 …
Characterization Of Metal/Carbon Multilayers By Raman Spectroscopy, David D. Allred, Qi Wang, Jesus González-Hernández
Characterization Of Metal/Carbon Multilayers By Raman Spectroscopy, David D. Allred, Qi Wang, Jesus González-Hernández
Faculty Publications
Laser Raman spectroscopy has been found to be useful for characterizing amorphous semiconductor multilayers, especially the interfaces of multilayers. Recently, we have extended this technique to the characterization of magnetron sputtered multilayers commonly used as reflectors in soft x-ray optics. Unlike the multilayers previously studied which contained only semiconductors and dielectrics, these are generally semiconductor/metal multilayers. We report here on the Raman characterization of the most common class of multilayers used in soft x-ray optics, those that contain a high density metal like tungsten interspersed with layers of carbon. In all of the metal/carbon multilayers the dominate feature in the …