Physics Commons^™

Encapsulated 2d Materials And The Potential For 1d Electrical Contacts, Sarah Wittenburg

Physics Undergraduate Honors Theses

The utilization of two-dimensional materials and heterostructures, particularly graphene and hexagonal boron nitride, have garnered significant attention in the realm of nanoelectronics due to their unique properties and versatile functionalities. This study focuses on the synthesis and fabrication processes of monolayer graphene encapsulated between layers of hBN, aiming to explore the potential of these heterostructures for various electronic applications. The encapsulation of graphene within hBN layers not only enhances device performance but also shields graphene from environmental contaminants, ensuring long-term stability. Experimental techniques, including mechanical exfoliation and stamp-assisted transfer, are employed to construct three-layer stacks comprising hBN-graphene-hBN. The fabrication process …

Subwavelength Engineering Of Silicon Photonic Waveguides, Farhan Bin Tarik

All Dissertations

The dissertation demonstrates subwavelength engineering of silicon photonic waveguides in the form of two different structures or avenues: (i) a novel ultra-low mode area v-groove waveguide to enhance light-matter interaction; and (ii) a nanoscale sidewall crystalline grating performed as physical unclonable function to achieve hardware and information security. With the advancement of modern technology and modern supply chain throughout the globe, silicon photonics is set to lead the global semiconductor foundries, thanks to its abundance in nature and a mature and well-established industry. Since, the silicon waveguide is the heart of silicon photonics, it can be considered as the core …

Interferometric Lithography- An Approach To Large Area And Cost Effective Nanopatterning, Vineeth Sasidharan

Optical Science and Engineering ETDs

In this dissertation interferometric lithography is approached in two different ways to address two important constraints of nanopatterning. One approach solves the problem of scaling up interferometric lithography to wafer scale (4 inch or larger) area. Through the second approach we have developed a nanopatterning technique based on interferometric lithography by using an inexpensive (~$100) diode laser as source, making interferometric lithography a very cost-effective technique.

Wafer-scale large-area nanopatterning was developed using an amplitude grating mask as a grating beam splitter along with spatial averaging of laser intensity by wobbling. The longitudinal and transverse coherence issues both are eased by …