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Emissivity Of Patterned Silicon Wafers In Rapid Thermal Processing, Markus Rabus
Emissivity Of Patterned Silicon Wafers In Rapid Thermal Processing, Markus Rabus
Theses
The influence of patterns on emissivity in silicon wafers in rapid thermal processing systems has been investigated. In this study, two experiments with layered and patterned silicon wafers were conducted. The main difference in the experiments is the way in which the temperature was controlled. The first experiment was performed under Open Loop Intensity Control (OLIC). For OLIC, no feedback from the wafer is returned. It is assumed that supplying a certain power level will lead to the desired temperature. The other experiment used the Closed Loop Intensity Control. In this case, a feedback, in the form of temperature deviation …
An Analysis Of Changes In The Magnetic Field Of Active Region 9415 After The 2001 April 6 Solar Flare, Juli Marya Stoltz
An Analysis Of Changes In The Magnetic Field Of Active Region 9415 After The 2001 April 6 Solar Flare, Juli Marya Stoltz
Theses
The objective of this study was to further the current understanding of the correlation between solar flares and magnetic flux change. The average gradient of the magnetic flux around the neutral line of Active Region 9415 and the locations of the magnetic flux centers-of-mass in both polarities in AR 9415 were determined. Subsequent to the 2001 April 6 flare, there was a statistically significant mean increase of 0.00208 G/km in the average gradient. Prior to the flare, the magnetic flux centers-of-mass became increasingly sheared along the neutral line. After the flare, this shear suddenly decreased and the magnetic flux centers-of-mass …