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Full-Text Articles in Physics
Coupling Into Waveguide Evanescent Modes With Applications In Electron Paramagnetic Resonance, Jason Walter Sidabras
Coupling Into Waveguide Evanescent Modes With Applications In Electron Paramagnetic Resonance, Jason Walter Sidabras
Master's Theses (2009 -)
The use of analytical and numerical techniques in solving the coupling of evanescent modes in a microwave waveguide through slots can be optimized to create a uniform magnetic field excitation on axis within a waveguide. This work has direct applications in Electron Paramagnetic Resonance (EPR) where a 100~kHz time-varying magnetic field is incident on a sample contained in a microwave cavity. Typical cavity designs do not take into consideration the uniformity of the 100~kHz field modulation and assume it to be uniform enough over the sample region from quasi-static principles. This work shows otherwise and uses Ansoft (Pittsburgh, PA) High …
Monocular Passive Ranging By An Optical System With Band Pass Filtering, Joel R. Anderson
Monocular Passive Ranging By An Optical System With Band Pass Filtering, Joel R. Anderson
Theses and Dissertations
An instrument for monocular passive ranging based on atmospheric oxygen absorption near 762 nm has been designed, built and deployed to track emissive targets, including the plumes from jet engines or rockets. An intensified CCD array is coupled to variable band pass liquid crystal display filter and 3.5 – 8.8 degree field of view optics to observe the target. By recording sequential images at 7 Hz in three 6 nm width bands, the transmittance of the R-branch of the O2 (X-b) (0,0) band is determined. A metric curve for determining range from transmittance is developed using the HITRAN spectral …
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Legacy Theses & Dissertations (2009 - 2024)
Electron Beam Lithography (EBL) is one of the most important and most widely used methods for nano-fabrication. The primary advantage of electron beam lithography is its high resolution, and its ability to expose nanometer features without a mask. On the other hand, one of the key limitations of electron beam lithography is throughput. Slow blanking speed is one of the major bottlenecks for the system speed. In this dissertation, I will first review the prior literature of high speed blanking. Thorough theoretical and experimental studies are done on the existing designs. Physical models are built and analytical ray tracing is …