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Full-Text Articles in Physics
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Legacy Theses & Dissertations (2009 - 2024)
Surface plasmon polariton (SPP) assisted photoelectron source array is proposed for use in distributed multiple electron beam lithography applications. Individual source is composed of a metal/dielectric surface structure with concentric circular grooves of subwavelength width surrounding a sub-wavelength aperture. Such optical power concentrators, called "plasmonic lenses", collect light incident over a broad area by converting it to surface electromagnetic waves, specifically SPP's, through diffraction by the sub-wavelength grooves surrounding the aperture. Through constructive interference of the generated SPPs between neighboring grooves, controlled by the periodicity of the grooves, high optical power densities can be achieved at the center of the …
Design, Fabrication, And Testing Of High-Transparency Deep Ultra-Violet Contacts Using Surface Plasmon Coupling In Subwavelength Aluminum Meshes, Clarisse Mazuir
Design, Fabrication, And Testing Of High-Transparency Deep Ultra-Violet Contacts Using Surface Plasmon Coupling In Subwavelength Aluminum Meshes, Clarisse Mazuir
Electronic Theses and Dissertations
The present work aims at enhancing the external quantum efficiencies of ultra-violet (UV) sensitive photodetectors (PDs) and light emitting diodes (LEDs)for any light polarization. Deep UV solid state devices are made out of AlGaN or MgZnO and their performances suffer from the high resistivity of their p-doped regions. They require transparent p-contacts; yet the most commonly used transparent contacts have low transmission in the UV: indium tin oxide (ITO) and nickel-gold (Ni/Au 5/5 nms) transmit less than 50% and 30% respectively at 300 nm. Here we investigate the use of surface plasmons (SPs) to design transparent p-contacts for AlGaN devices …
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Legacy Theses & Dissertations (2009 - 2024)
Electron Beam Lithography (EBL) is one of the most important and most widely used methods for nano-fabrication. The primary advantage of electron beam lithography is its high resolution, and its ability to expose nanometer features without a mask. On the other hand, one of the key limitations of electron beam lithography is throughput. Slow blanking speed is one of the major bottlenecks for the system speed. In this dissertation, I will first review the prior literature of high speed blanking. Thorough theoretical and experimental studies are done on the existing designs. Physical models are built and analytical ray tracing is …
Radiation Studies Of The Tin-Doped Microscopic Droplet Laser Plasma Light Source Specific To Euv Lithography, Chiew-Seng Koay
Radiation Studies Of The Tin-Doped Microscopic Droplet Laser Plasma Light Source Specific To Euv Lithography, Chiew-Seng Koay
Electronic Theses and Dissertations
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes <35 nm. One major challenge to its implementation is the development of a 13.5 nm EUV source of radiation that meets the requirements of current roadmap designs of the source of illumination in commercial EUVL scanners. The light source must be debris-free, in a free-space environment with the imaging EUV optics that must provide sufficient, narrow spectral band EUV power to print 100 wafers/hr. To meet this need, extensive studies on emission from a laser plasma source utilizing tin-doped droplet target was conducted. Presented in this work, are the many optical techniques such as spectroscopy, radiometry, and imaging, that were employed to characterize and optimize emission from the laser plasma source State of the art EUV spectrographs were employed to observe the source's spectrum under various laser irradiation conditions. Comparing the experimental spectra to those from theory, has allowed the determination of the Sn ion stages responsible for emitting into the useful EUV bandwidth. Experimental results were compared to spectral simulations obtained using Collisional-Radiative Equilibrium (CRE) model, as well. Moreover, extensive measurements surveying source emission from 2 nm to 30 nm, which is the region of the electromagnetic spectrum defined as EUV, was accomplished. Absolutely calibrated metrology was employed with the Flying Circus instrument from which the source's conversion efficiency (CE)--from laser to the useful EUV energy--was characterized under various laser irradiation conditions. Hydrodynamic simulations of the plasma expansion together with the CRE model predicted the condition at which optimum conversion could be attained. The condition was demonstrated experimentally, with the highest CE to be slightly above 2%, which is the highest value among all EUV source contenders. In addition to laser intensity, the CE was found to depend on the laser wavelength. For better understanding, this observation is compared to results from simulations. Through a novel approach in imaging, the size of the plasma was characterized by recording images of the plasma within a narrow band, around 13.5 nm. The size, approximately 100 ìm, is safely within the etendue limit set by the optical elements in the EUV scanner. Finally, the notion of irradiating the target with multiple laser beams was explored for the possibility of improving the source's conversion efficiency.
Additive Lithography Fabrication And Integration Of Micro Optics, Mahesh Pitchumani
Additive Lithography Fabrication And Integration Of Micro Optics, Mahesh Pitchumani
Electronic Theses and Dissertations
Optical elements are the fundamental components in photonic systems and are used to transform an input optical beam into a desired beam profile or to couple the input beam into waveguides, fibers, or other optical systems or devices. Macroscopic optical elements are easily fabricated using grinding and polishing techniques, but few methods exist for inexpensive fabrication of micro optical elements. In this work we present an innovative technique termed Additive Lithography that makes use of binary masks and controlled partial exposures to sculpt photoresist into the desired optical surface relief profile. We explore various masking schemes for fabricating a variety …