Physics Commons^™

Nanomechanical And Morphological Characterization Of Tungsten Trioxide (Wo3) Thin Films Grown By Atomic Layer Deposition, M. A. Mamun, K. Zhang, H. Baumgart, A. A. Elmustafa

Mechanical & Aerospace Engineering Faculty Publications

This study investigates the nanomechanical properties and surface morphology of tungsten oxide WO₃thin films deposited on p-type Si(100) substrates using atomic layer deposition (ALD) technology with 2000 ALD deposition cycles at a growth temperature of 300°C and annealed at different temperatures. The samples were further furnace annealed at 500, 600 and 700°C for 60 min. The influence of the deposition process on the structure and properties of the WO₃ films is discussed, presented and correlated to the characteristic features of the ALD technique. The results depict significant difference in the hardness and modulus measurements between the as …