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Full-Text Articles in Physics
Implementing A Self-Corrected Chemical Potential Scheme In Determinant Quantum Monte Carlo Simulations, Kevin Gordon Kleiner
Implementing A Self-Corrected Chemical Potential Scheme In Determinant Quantum Monte Carlo Simulations, Kevin Gordon Kleiner
Chancellor’s Honors Program Projects
No abstract provided.
Mechanisms Of Euv Exposure : Photons, Electrons And Holes, Amrit Kausik Narasimhan
Mechanisms Of Euv Exposure : Photons, Electrons And Holes, Amrit Kausik Narasimhan
Legacy Theses & Dissertations (2009 - 2024)
The microelectronics industry’s movement toward smaller and smaller feature sizes has necessitated a shift to Extreme Ultra-Violet (EUV) lithography to be able to pattern sub 20-nm features, much like earlier shifts from i-line to 248 nm. However, this shift from 193-nm lithography to EUV (13.5 nm) poses significant obstacles. EUV is the first optical lithography to operate in an energy range (92 eV per photon vs. 6.4 eV per photon for 193 nm lithography) above the electron binding energies of common resist atomic species. This significant energy increase complicates resist design. For exposures of equal dose, resists receive 14 times …
Surface Microstructure Evolution Of Metallic Specimens Using The Large Chamber Scanning Electron Microscope, Grace Egbujor
Surface Microstructure Evolution Of Metallic Specimens Using The Large Chamber Scanning Electron Microscope, Grace Egbujor
Masters Theses & Specialist Projects
An initial study into the use of the large chamber scanning electron microscope (LCSEM) to interrogate the surface microstructure evolution of metallic specimens has been carried out. The LC-SEM located at Western Kentucky University is the largest instrument of its type at any university in the world. As such, unique measurements can be performed due to the size of its chamber and extended view of its optic system. Strain was varied for each individual specimen, and imaged using Secondary Electrons within the gauge length as well as near the grip position. Results will show progression of surface microstructures and nickel …
Electron-Induced Electron Yields Of Uncharged Insulating Materials, Ryan Carl Hoffmann
Electron-Induced Electron Yields Of Uncharged Insulating Materials, Ryan Carl Hoffmann
All Graduate Theses and Dissertations, Spring 1920 to Summer 2023
Presented here are electron-induced electron yield measurements from high-resistivity, high-yield materials to support a model for the yield of uncharged insulators. These measurements are made using a low-fluence, pulsed electron beam and charge neutralization to minimize charge accumulation. They show charging induced changes in the total yield, as much as 75%, even for incident electron fluences of <3 fC/mm2, when compared to an uncharged yield. The evolution of the yield as charge accumulates in the material is described in terms of electron recapture, based on the extended Chung and Everhart model of the electron emission spectrum and the dual dynamic …
Low-Fluence Electron Yields Of Highly Insulating Materials, Ryan Hoffmann, Jr Dennison, Clint D. Thomson, Jennifer Albretson
Low-Fluence Electron Yields Of Highly Insulating Materials, Ryan Hoffmann, Jr Dennison, Clint D. Thomson, Jennifer Albretson
Journal Articles
Electron-induced electron yields of high-resistivity, high-yield materials - ceramic polycrystalline aluminum oxide and the polymer polyimide (Kapton HN), - were made by using a low-fluence, pulsed incident electron beam and charge neutralization electron source to minimize charge accumulation. Large changes in energy-dependent total yield curves and yield decay curves were observed, even for incident electron fluences of <3 fC/mm2. The evolution of the electron yield as charge accumulates in the material is modeled in terms of electron re-capture based on an extended Chung-Everhart model of the electron emission spectrum. This model is used to explain anomalies measured in highly insulating, …