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Full-Text Articles in Physics
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Characterization Of Optical Constants For Uranium From 10 To 47 Nm, Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Faculty Publications
We use a laser high-harmonics-based extreme-ultraviolet (EUV) polarimeter to determine the optical constants of elemental uranium in the wavelength range from 10 to 47 nm. The constants are extracted from the measure ratio of p-polarized to s-polarized reflectance from a thin uranium film deposited in situ. The film thickness is inferred from a spectroscopic ellipsometry measurement of the sample after complete oxidation in room air. Uranium has been used as a high-reflectance material in the EUV. However, difficulties with oxidation prevented its careful characterization previous to this study. We find that measured optical constants for uranium vary significantly from previous …
Extreme-Ultraviolet Polarimeter Utilizing Laser-Generated High-Order Harmonics, Nicole Brimhall, Matthew Turner, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Extreme-Ultraviolet Polarimeter Utilizing Laser-Generated High-Order Harmonics, Nicole Brimhall, Matthew Turner, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, Justin Peatross
Faculty Publications
We describe an extreme-ultraviolet (EUV) polarimeter that employs laser-generated high-order harmonics as the light source. The polarimeter is designed to characterize materials and thin films for use with EUV light. Laser high harmonics are highly directional with easily rotatable linear polarization, not typically available with other EUV sources. The harmonics have good wavelength coverage, potentially spanning the entire EUV from a few to a hundred nanometers. Our instrument is configured to measure reflectances from 14 to 30 nm and has ~180 spectral resolution (lambda/delta lambda). The reflection from a sample surface can be measured over a continuous range of incident …
Nanoscale Characterization Of Thin Film Coatings Using Annular Dark Field Scanning Transmission Electron Microscopy, Guillermo Acosta, Richard Vanfleet, David D. Allred
Nanoscale Characterization Of Thin Film Coatings Using Annular Dark Field Scanning Transmission Electron Microscopy, Guillermo Acosta, Richard Vanfleet, David D. Allred
Faculty Publications
When considering the optical performance of thin films in the Extreme Ultraviolet (EUV), developing an accurate physical description of a thin film coating is necessary to be able to successfully model optical performance. With the short wavelengths of the EUV, film interfaces and sample roughness warrant special attention and care. The surfaces of thin film samples are routinely measured by Atomic Force Microscopy, from which roughness can be determined. However, characterizing the quality of interfaces below the surface is much more challenging. In a recent study of scandium oxide thin films, High Resolution Transmission Electron Microscopy and Annular Dark Field …
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Optical Properties And Application Of Uranium-Based Thin Films For The Extreme Ultraviolet And Soft X-Ray Region, Richard L. Sandberg, David D. Allred, Shannon Lunt, Marie K. Urry, R. Steven Turley
Faculty Publications
Uranium oxide and uranium nitride thin films reflect significantly more than all previously known/standard reflectors (e.g., nickel, gold, and iridium) for most of the 4-10 nm range at low angles of incidence. This work includes measurements of the EUV/soft x-ray (2-20 nm) reflectance of uranium-based thin films (~20 nm thick) and extraction of their optical constants (d and ?). We report the reflectances at 5, 10, and 15 degrees grazing incidence of air-oxidized sputtered uranium, reactively sputtered (O2) uranium oxide, and reactively sputtered (N2) uranium nitride thin films measured at Beamline 6.3.2 at the Advanced Light Source (ALS) at Lawrence …