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Full-Text Articles in Physics
Effective Medium Theory, Rough Surfaces, And Moth’S Eyes, David D. Allred, Zephne Larsen, Joseph Muhlestein, R. Steven Turley, Anthony Willey
Effective Medium Theory, Rough Surfaces, And Moth’S Eyes, David D. Allred, Zephne Larsen, Joseph Muhlestein, R. Steven Turley, Anthony Willey
Faculty Publications
Optics in the extreme ultraviolet (XUV) have important applications in microelectronics, microscopy, space physics, and in imaging plasmas. Because of the short wavelengths involved in these applications, it is critical to account for interfacial roughness to accurately predict the reflection and absorption of XUV optics. This paper examines two possible effects of roughness on optical absorption, non-specular reflection and enhanced transmission and compares these to measured experimental data on a rough Y2O3 thin film.
Determining The Refractive Index In The Extreme Ultraviolet Using Kramers-Kronig On Thin-Film Scandium Oxide Transmission Data, David D. Allred, Jacqualine J. Butterfield
Determining The Refractive Index In The Extreme Ultraviolet Using Kramers-Kronig On Thin-Film Scandium Oxide Transmission Data, David D. Allred, Jacqualine J. Butterfield
Faculty Publications
Whereas the real part of the refractive index is dependent on both transmittance and reflectance, the imaginary part can be determined from transmittance data alone. It is possible to use Kramers-Kronig analysis to calculate the real part if the imaginary part is known over a sufficiently broad range. We show that the delta calculated from reflection and transmission data without taking into account roughness may underestimate the real part of the refractive index of the scandium oxide samples we are studying by up to 40% near 270 eV.
Thorium-Based Thin Films As Highly Reflective Mirrors In The Euv, David D. Allred, William R. Evans, Jed E. Johnson, Richard L. Sandberg, R. Steven Turley
Thorium-Based Thin Films As Highly Reflective Mirrors In The Euv, David D. Allred, William R. Evans, Jed E. Johnson, Richard L. Sandberg, R. Steven Turley
Faculty Publications
As applications for extreme ultraviolet (EUV) radiation have been identified, the demand for better optics has also increased. Thorium and thorium oxide thin films (19 to 61 nm thick) were RF-sputtered and characterized using atomic force microscopy (AFM), spectroscopic ellipsometry, low-angle x-ray diffraction (LAXRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES) in order to assess their capability as EUV reflectors. Their reflectance and absorption at different energies were also measured and analyzed at the Advanced Light Source in Berkeley. The reflectance of oxidized thorium is reported between 2 and 32 nm at 5, 10, and 15 …