Open Access. Powered by Scholars. Published by Universities.®
Physical Sciences and Mathematics Commons™
Open Access. Powered by Scholars. Published by Universities.®
- Discipline
- Institution
- Publication Type
Articles 1 - 3 of 3
Full-Text Articles in Physical Sciences and Mathematics
Kinetic Monte Carlo Investigations Involving Atomic Layer Deposition Of Metal-Oxide Thinfilms, David Tyler Magness
Kinetic Monte Carlo Investigations Involving Atomic Layer Deposition Of Metal-Oxide Thinfilms, David Tyler Magness
MSU Graduate Theses
Atomic Layer Deposition is a method of manufacturing thin film materials. Metal-oxides such as zinc-oxide and aluminum-oxide are particularly interesting candidates for use in microelectronic devices such as tunnel junction barriers, transistors, Schottky diodes, and more. By adopting a 3D Kinetic Monte Carlo model capable of simulating ZnO deposition, the effect of parameters including deposition temperature, chamber pressure, and composition of the initial substrate at the beginning of deposition can be investigated. This code generates two random numbers: One is used to select a chemical reaction to occur from a list of all possible reactions and the second is used …
Heterostructure Of 2d Materials: Hfs2/Hfo2/Si, Christopher J. Robledo
Heterostructure Of 2d Materials: Hfs2/Hfo2/Si, Christopher J. Robledo
MSU Graduate Theses
Heterostructures have been utilized in electronic devices for over 50 years with the proposal for the first heterostructure transistor in 1957. With the scaling of devices, it is necessary to create new heterostructures that will comply with Moore’s Law, as well as make devices faster and consume less power. Novel 2D materials, such as hafnium disulfide, have shown promise as an active channel layer, while hafnium dioxide is already proven to be a replacement of silicon dioxide for the gate insulating layer. However, fabrication techniques for wide-scale integration of these heterostructures have not yet been achieved. Also, the dielectric properties …
Atomic Layer Deposition Of Zirconium Oxide Thin Film On An Optical Fiber Forcladding Light Strippers, Ali̇ Karatutlu
Atomic Layer Deposition Of Zirconium Oxide Thin Film On An Optical Fiber Forcladding Light Strippers, Ali̇ Karatutlu
Turkish Journal of Physics
Cladding light strippers are essential components in high-power fiber lasers used for removal of unwanted cladding light that can distort the beam quality or even damage the whole fiber laser system. In this study, an Atomic Layer Deposition system was used for the first time to prepare the cladding light stripper devices using a 40 nm thick zirconia layer grown on optical fiber. The thickness of the zirconia coating was confirmed using the Scanning Electron Microscopy (SEM) and the Ellipsometry techniques. The elemental analysis was also performed using the wavelength dispersive X-ray spectroscopy technique. The Raman spectroscopy and XRD data …