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Articles 1 - 6 of 6
Full-Text Articles in Physical Sciences and Mathematics
Effect Of Fabrication Parameters On The Ferroelectricity Of Hafnium Zirconium Oxide Films: A Statistical Study, Guillermo A. Salcedo, Ahmad E. Islam, Elizabeth Reichley, Michael Dietz, Christine M. Schubert Kabban, Kevin D. Leedy, Tyson C. Back, Weison Wang, Andrew Green, Timothy S. Wolfe, James M. Sattler
Effect Of Fabrication Parameters On The Ferroelectricity Of Hafnium Zirconium Oxide Films: A Statistical Study, Guillermo A. Salcedo, Ahmad E. Islam, Elizabeth Reichley, Michael Dietz, Christine M. Schubert Kabban, Kevin D. Leedy, Tyson C. Back, Weison Wang, Andrew Green, Timothy S. Wolfe, James M. Sattler
Faculty Publications
Ferroelectricity in hafnium zirconium oxide (Hf1−xZrxO2) and the factors that impact it have been a popular research topic since its discovery in 2011. Although the general trends are known, the interactions between fabrication parameters and their effect on the ferroelectricity of Hf1−xZrxO2 require further investigation. In this paper, we present a statistical study and a model that relates Zr concentration (x), film thickness (tf), and annealing temperature (Ta) with the remanent polarization (Pr) in tungsten (W)-capped Hf1−xZrxO2. …
Improved Gas Sensing Performance Of Ald Azo 3-D Coated Zno Nanorods, P. Lin, X. Chen, K. Zhang, H. Baumgart
Improved Gas Sensing Performance Of Ald Azo 3-D Coated Zno Nanorods, P. Lin, X. Chen, K. Zhang, H. Baumgart
Electrical & Computer Engineering Faculty Publications
This paper reports an enhancement on the sensing performance of ZnO nanorod ethanol sensors with a new approach by utilizing nested coatings of Aluminum doped ZnO (AZO) thin films by Atomic Layer Deposition (ALD) technology. ZnO nanorods were grown by the hydrothermal method with the ZnO seed layer synthesized on Silicon wafers by ALD. To enhance the sensing performance of ZnO nanorod ethanol sensors, multiple coated AZO thin film 3-D coatings were deposited on the surface of the intrinsic ZnO nanorods by ALD.To investigate the sensing performance of the ZnO nanorods sensor for the detection of ethanol vapor, a gas …
Chemically Stable Artificial Sei For Li-Ion Battery Electrodes, Qinglin Zhang, Lei Han, Jie Pan, Zhi Chen, Yang-Tse Cheng
Chemically Stable Artificial Sei For Li-Ion Battery Electrodes, Qinglin Zhang, Lei Han, Jie Pan, Zhi Chen, Yang-Tse Cheng
Chemical and Materials Engineering Faculty Publications
The importance of coating's chemical stability in lithium-ion batteries has been demonstrated by this study. It is well known that the mechanical properties determine the cycle life, and chemical stability or chemical degradation rate determines the calendar life. In this study, we used HfO2 coatings prepared by atomic layer deposition as an example to show the chemical stability of the coatings for lithium ion battery electrodes.
Effects Of Metallic, Semiconducting, And Insulating Substrates On The Coupling Involving Radiative Polaritons In Thin Oxide Films, Anita J. Vincent-Johnson, Kyle A. Vasquez, Giovanna Scarel, James S. Hammonds Jr., Mathieu Francoeur
Effects Of Metallic, Semiconducting, And Insulating Substrates On The Coupling Involving Radiative Polaritons In Thin Oxide Films, Anita J. Vincent-Johnson, Kyle A. Vasquez, Giovanna Scarel, James S. Hammonds Jr., Mathieu Francoeur
Department of Physics and Astronomy - Faculty Scholarship
Through simulations, this work explores the effects of conducting, semiconducting, and insulating substrates on the absorption of infrared radiation by radiative polaritons in oxide layers with thicknesses that range from 30 nm to 9 μm. Using atomic layer deposition, oxide layers can be formed in the nanometer scale. Our results suggest that the chemistry and conductivity of the substrate determine the amount of absorption by radiative polaritons in oxide layers thinner than the skin depth. The effects of the chemistry and conductivity of the substrate are especially effective for oxide films thinner than about 250 nm, which we label as …
Wetting Properties Induced In Nano-Composite Poss-Ma Polymer Films By Atomic Layer Deposited Oxides, Kyle A. Vasquez, Anita J. Vincent-Johnson, W. Chris Hughes, Brian H. Augustine, Kyoungmi Lee, Gregory N. Parsons, Giovanna Scarel
Wetting Properties Induced In Nano-Composite Poss-Ma Polymer Films By Atomic Layer Deposited Oxides, Kyle A. Vasquez, Anita J. Vincent-Johnson, W. Chris Hughes, Brian H. Augustine, Kyoungmi Lee, Gregory N. Parsons, Giovanna Scarel
Department of Physics and Astronomy - Faculty Scholarship
Due to their unique properties, nano-composite polyhedral oligomeric silsequioxane (POSS) copolymer films are attractive for various applications. Here we show that their natural hydrophobic character can become hydrophilic when the films are modified by a thin oxide layer, up to 8 nm thick, prepared using atomic layer deposition. A proper choice of the deposition temperature and thickness of the oxide layer are required to achieve this goal. Unlike other polymeric systems, a marked transition to a hydrophilic state is observed with oxide layers deposited at increasing temperatures up to the glass transition temperature (∼110 °C) of the POSS copolymer film. …
Tris(Dialkylamino)Aluminums: Syntheses, Characterization, Volatility Comparison, And Atomic Layer Deposition Of Alumina Thin Films, Casey R. Wade, Carter Silvernail, Chiranjib Banerjee, Axel Soulet, James Mcandrew, John A. Belot Jr.
Tris(Dialkylamino)Aluminums: Syntheses, Characterization, Volatility Comparison, And Atomic Layer Deposition Of Alumina Thin Films, Casey R. Wade, Carter Silvernail, Chiranjib Banerjee, Axel Soulet, James Mcandrew, John A. Belot Jr.
Chemistry Department: Faculty Publications
The syntheses and characterization of both tris(diethylamino)aluminum and tris(diisopropylamino)aluminum are presented in this letter. Characterization includes vapor pressure measurements and comparison of the two non-pyrophoric precursors showing them to be viable alternatives to trimethylaluminum. Ultimately, tris(diisopropyl)aluminum was successful in the atomic layer deposition of alumina thin films.