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Full-Text Articles in Physical Sciences and Mathematics
Stable Highly Conductive Zno Via Reduction Of Zn Vacancies, David C. Look, Timothy C. Droubay, Scott A. Chambers
Stable Highly Conductive Zno Via Reduction Of Zn Vacancies, David C. Look, Timothy C. Droubay, Scott A. Chambers
Physics Faculty Publications
Growth of Ga-doped ZnO by pulsed laser deposition at 200 °C in an ambient of Ar and H2produces a resistivity of 1.5 × 10−4 Ω-cm, stable to 500 °C. The resistivity can be further reduced to 1.2 × 10−4 Ω-cm by annealing on Zn foil, which reduces the compensating Zn-vacancy acceptor concentration NA to 5 × 1019 cm−3, only 3% of the Ga-donor concentration ND of 1.6 × 1021 cm−3, with ND and NA determined from a degenerate mobility theory. The plasmon-resonance wavelength is only 1060 …
Deep Traps In Algan/Gan Heterostructures Studied By Deep Level Transient Spectroscopy: Effect Of Carbon Concentration In Gan Buffer Layers, Z-Q. Fang, B. Claflin, David C. Look, D. S. Green, R. Vetury
Deep Traps In Algan/Gan Heterostructures Studied By Deep Level Transient Spectroscopy: Effect Of Carbon Concentration In Gan Buffer Layers, Z-Q. Fang, B. Claflin, David C. Look, D. S. Green, R. Vetury
Physics Faculty Publications
Electrical properties, including leakage currents, threshold voltages, and deep traps, of AlGaN/GaN heterostructure wafers with different concentrations of carbon in the GaN buffer layer, have been investigated by temperature dependent current-voltage and capacitance-voltage measurements and deep level transient spectroscopy (DLTS), using Schottky barrier diodes (SBDs). It is found that (i) SBDs fabricated on the wafers with GaN buffer layers containing a low concentration of carbon (low-[C] SBD) or a high concentration of carbon (high-[C] SBD) have similar low leakage currents even at 500 K; and (ii) the low-[C] SBD exhibits a larger (negative) threshold voltage than the high-[C] SBD. Detailed …
Highly Conductive Zno Grown By Pulsed Laser Deposition In Pure Ar, Robin C. Scott, Kevin D. Leedy, Burhan Bayraktaroglu, David C. Look, Yong-Hang Zhang
Highly Conductive Zno Grown By Pulsed Laser Deposition In Pure Ar, Robin C. Scott, Kevin D. Leedy, Burhan Bayraktaroglu, David C. Look, Yong-Hang Zhang
Physics Faculty Publications
Ga-doped ZnO was deposited by pulsed laser deposition at 200 °C on SiO2/Si, Al2O3, or quartz in 10 mTorr of pure Ar. The as-grown, bulk resistivity at 300 K is 1.8×10−4 Ω cm, three-times lower than that of films deposited at 200 °C in 10 mTorr of O2 followed by an anneal at 400 °C in forming gas. Furthermore, depth uniformity of the electrical properties is much improved. Mobility analysis shows that this excellent resistivity is mostly due to an increase in donor concentration, rather than a decrease in acceptor concentration. Optical …
Mobility Analysis Of Highly Conducting Thin Films: Application To Zno, David C. Look, K. D. Leedy, D. H. Tomich, B. Bayraktaroglu
Mobility Analysis Of Highly Conducting Thin Films: Application To Zno, David C. Look, K. D. Leedy, D. H. Tomich, B. Bayraktaroglu
Physics Faculty Publications
Hall-effect measurements have been performed on a series of highly conductive thin films of Ga-doped ZnO grown by pulsed laser deposition and annealed in a forming-gas atmosphere (5% H2 in Ar). The mobility as a function of thickness d is analyzed by a simple formula involving only ionized-impurity and boundary scattering and having a single fitting parameter, the acceptor/donor concentration ratio K = NA/ND. For samples with d = 3–100 nm, Kavg = 0.41, giving ND = 4.7×1020 and NA = 1.9×1020 cm−3. Thicker samples require a …
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Physics Faculty Publications
To study the quality of thin metal/ZnO Schottky contacts (SCs), temperature-dependent current-voltage (I-V), capacitance-voltage, deep level transient spectroscopy, and photoluminescence measurements were performed using bulk, vapor-phase ZnO, treated by remote oxygen plasma (ROP). Au/ZnO and Pd/ZnO contacts on both O and Zn faces are compared as a function of the ROP processing sequence and duration. We find that (i) as the duration of ROP treatment increases from 2 to 4 h, Au/ZnO contacts on the Zn face, deposited before ROP treatment, become rectifying, while those on the O face remain Ohmic; (ii) with long-term ROP …
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Physics Faculty Publications
High quality, bulk ZnO crystals grown by Tokyo Denpa using the hydrothermal process typically exhibit a room temperature carrier concentration in the 1013–1014 cm−3 range and a low mobility, conductive surface layer, observed at low temperature, with a sheet concentration on the order of 1012–1013 cm−2. In the sample discussed here, bulk conduction is controlled by two donor levels at 50 and 400 meV with concentrations of 1.2×1016 and 1.5×1016 cm−3, respectively. Temperature-dependent photo-Hall-effect measurements, using blue/UV light, in vacuum show an increase in the surface sheet …
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
Physics Faculty Publications
In was implanted into bulk ZnO creating a square profile with a thickness of about 100 nm and an In concentration of about 1×1020 cm-3. The layer was analyzed with Rutherford backscattering, temperature-dependent Hall effect, and low-temperature photoluminescence measurements. The implantation created a nearly degenerate carrier concentration n of about 2×1019 cm-3, but with a very low mobility μ, increasing from about 0.06 cm2/V s at 20 K to about 2 cm2/V s at 300 K. However, after annealing at 600 °C for 30 min, n increased to about 5×10 …
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Physics Faculty Publications
Low-temperature photoluminescence (PL) and temperature-dependent Hall-effect (T-Hall) measurements were carried out in undoped and Ga-doped ZnO thin films grown by molecular-beam epitaxy. As the carrier concentration increases from 1.8×1018 to 1.8×1020 cm−3, the dominant PL line at 9 K changes from I1 (3.368–3.371 eV) to IDA (3.317–3.321 eV), and finally to I8 (3.359 eV). The dominance of I1, due to ionized-donor bound excitons, is unexpected in n-type samples but is shown to be consistent with the T-Hall results. We also show that IDA has characteristics of …
Electroluminescence Efficiency Enhancement Using Metal Nanoparticles, Jacob B. Khurgin, Greg Sun, R. A. Soref
Electroluminescence Efficiency Enhancement Using Metal Nanoparticles, Jacob B. Khurgin, Greg Sun, R. A. Soref
Physics Faculty Publications
We apply the “effective mode volume” theory to evaluate enhancement of the electroluminescence efficiency of semiconductor emitters placed in the vicinity of isolated metal nanoparticles and their arrays. Using the example of an InGaN/GaN quantum-well active region positioned in close proximity to Ag nanospheres, we show that while the enhancement due to isolated metal nanoparticles is large, only modest enhancement can be obtained with ordered array of those particles. We further conclude that random assembly of isolated particles holds an advantage over the ordered arrays for light emitting devices of finite area.
Practicable Enhancement Of Spontaneous Emission Using Surface Plasmons, Greg Sun, Jacob B. Khurgin, Richard A. Soref
Practicable Enhancement Of Spontaneous Emission Using Surface Plasmons, Greg Sun, Jacob B. Khurgin, Richard A. Soref
Physics Faculty Publications
The authors develop a rigorous theory of the enhancement of spontaneous emission from a light emitting device via coupling the radiant energy in and out of surface plasmon polaritons (SPPs) on the metal-dielectric interface. Using the GaN/Ag system as an example, the authors show that using SPP pays off only for emitters that have a low luminescence efficiency.
Nonlinear All-Optical Gan/Algan Multi-Quantum-Well Devices For 100 Gb/S Applications At Λ = 1.55 Μm, Greg Sun, Jacob B. Khurgin, Richard A. Soref
Nonlinear All-Optical Gan/Algan Multi-Quantum-Well Devices For 100 Gb/S Applications At Λ = 1.55 Μm, Greg Sun, Jacob B. Khurgin, Richard A. Soref
Physics Faculty Publications
Using quantum-mechanical analysis, a strain-balanced stack of coupled GaN/AlGaNquantum wells has been engineered for bandwidth-optimized all-optical switching at low switching powers. Intersubband transitions between three conduction subbands provide the basis for the large, fast, nonlinear optical response. Optimized performance for a given symbol rate is obtained by engineering the response time and nonlinear phase shift.
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Physics Faculty Publications
Deep-level transient spectroscopy measurements of n-type GaN epitaxial layers irradiated with 1-MeV electrons reveal an irradiation-induced electron trap at EC−0.18 eV. The production rate is approximately 0.2 cm−1, lower than the rate of 1 cm−1 found for the N vacancy by Hall-effect studies. The defect trap cannot be firmly identified at this time. ©1998 American Institute of Physics.
Optical Properties Of Gan Grown On Zno By Reactive Molecular Beam Epitaxy, F. Hamdani, A. Botchkarev, W. Kim, H. Morkoç, M. Yeadon, J. M. Gibson, S.-C. Y. Tsen, David J. Smith, Donald C. Reynolds, David C. Look, K. R. Evans, Cole W. Litton, William C. Mitchel, P. Hemenger
Optical Properties Of Gan Grown On Zno By Reactive Molecular Beam Epitaxy, F. Hamdani, A. Botchkarev, W. Kim, H. Morkoç, M. Yeadon, J. M. Gibson, S.-C. Y. Tsen, David J. Smith, Donald C. Reynolds, David C. Look, K. R. Evans, Cole W. Litton, William C. Mitchel, P. Hemenger
Physics Faculty Publications
High quality wurtzite GaN epilayers have been grown on ZnO(0001) substrates by reactive molecular beam epitaxy. Photoluminescence and reflectivity measurements point to high quality presumably due to the near match of both the crystal lattice parameter and the stacking order between GaN and ZnO. In addition, the good films lack the characteristic yellow photoluminescence band. Any misorientation of the GaN epilayer planes with respect to the ZnO substrate is not detectable with polarized reflectivity. The x-ray double crystal diffraction measurements indicate this misorientation is much smaller than those for GaN epilayers on SiC and Al2O3 . © …