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Plasmonics

Theses/Dissertations

University at Albany, State University of New York

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Full-Text Articles in Nanoscience and Nanotechnology

Tailoring The Optical Properties Of Silicon With Ion Beam Created Nanostructures For Advanced Photonics Applications, Perveen Akhter Jan 2016

Tailoring The Optical Properties Of Silicon With Ion Beam Created Nanostructures For Advanced Photonics Applications, Perveen Akhter

Legacy Theses & Dissertations (2009 - 2024)

In today’s fast life, energy consumption has increased more than ever and with that the demand for a renewable and cleaner energy source as a substitute for the fossil fuels has also increased. Solar radiations are the ultimate source of energy but harvesting this energy in a cost effective way is a challenging task. Si is the dominating material for microelectronics and photovoltaics. But owing to its indirect band gap, Si is an inefficient light absorber, thus requiring a thickness of solar cells beyond tens of microns which increases the cost of solar energy. Therefore, techniques to increase light absorption …


Investigation Of The Optical And Sensing Characteristics Of Nanoparticle Arrays For High Temperature Applications, Gnanaprakash Dharmalingam Jan 2016

Investigation Of The Optical And Sensing Characteristics Of Nanoparticle Arrays For High Temperature Applications, Gnanaprakash Dharmalingam

Legacy Theses & Dissertations (2009 - 2024)

The monitoring of polluting gases such as CO and NOx emitted from gas turbines in power plants and aircraft is important in order to both reduce the effects of such gases on the environment as well as to optimize the performance of the respective power system. The need for emissions monitoring systems is further realized from increased regulatory requirements that are being instituted as a result of the environmental impact from increased air travel. Specifically, it is estimated that the contributions from aircraft emissions to total NOx emissions will increase from 4% to 17% between 2008 and 2020. Extensive fuel …


Plasmonic Enhancement Of The Ellipsometric Measurement Of Thin Metal Lines, Samuel O'Mullane Jan 2015

Plasmonic Enhancement Of The Ellipsometric Measurement Of Thin Metal Lines, Samuel O'Mullane

Legacy Theses & Dissertations (2009 - 2024)

In semiconductor manufacturing, defect analysis and process control are extremely important for optimal device performance and yield enhancement. One in-line tool used for quick optical characterization is the ellipsometer. Because it is nondestructive and largely automated, ellipsometers have become key tools in this process. Scatterometry based optical critical dimension (OCD) analysis is the full optical modeling of ellipsometric measurements using regression-based structures. Specifically for metallic gratings, OCD has a couple of challenges. First, the sensitivity to changes in the width of the metal lines is decreasing for smaller widths. Second, the main scatterometry spectral simulation method (rigorous coupled wave analysis, …