Nanoscience and Nanotechnology Commons^™

Secondary Electron Interactions In Exposures Of Euv Photoresists, Steven Grzeskowiak

Legacy Theses & Dissertations (2009 - 2024)

The microelectronic industry’s movement toward smaller feature sizes has necessitated a shift to extreme ultraviolet (EUV) lithography to enable cost-effective patterning of sub 20-nm features. However, this shift from 193-nm lithography (6.4 eV) to EUV (13.5 nm, 92 eV) poses significant obstacles, such that photolithography is now operating in an energy range above the electron binding energies of common atomic species in photoresists. This significant energy increase means the chemical reactions happening within operate in the realm of radiation chemistry instead of photochemistry since the observed reactions are due almost entirely to the action of photoelectrons as they dissipate their …

Block Copolymer Nanostructures For Inorganic Oxide Nanopatterning, Krishna Pandey

MSU Graduate Theses

Self-assembled nature of block copolymer (BCP) makes them ideal for emerging technologies in nanometer scale. The micro phase separation between two or more dissimilar polymer blocks of BCP leads to uniform periodic nanostructures of different domains of dimension in the range of 5-100 nm, good for the development of emerging microelectronic and optoelectronics devices. Molecular weight and chain architecture of each blocks govern the morphology evolution; gives different structure like spherical, micelles, lamellae, cylindrical, gyroid etc. The morphology evolution of BCP nanostructure also depends on different external factors as well. In the first work of this thesis, three external factors …

Novel Uses Of Directly Patternable Silicon Oxide Based Resist For Advanced Patterning Applications, Vishal Umeshbhai Desai

Legacy Theses & Dissertations (2009 - 2024)

Novel applications for the directly-patternable resist material, hydrogen silsesquioxane (HSQ), were studied for multiple advanced lithography techniques. Initially, electron beam lithography (EBL) patterned low-resolution HSQ patterns were demonstrated as a mandrel in a self-aligned double patterning (SADP) approach. Using the novel EBL-SADP approach, the number of total process steps was reduced, as compared to conventional SADP methods. This work provided proof-of-concept for using HSQ resist as a directly-patternable mandrel and plasma enhanced chemical vapor deposited (PECVD) low-stress silicon nitride (LSSiN) as a spacer. Furthermore, rapid thermal annealing (RTA) was demonstrated as a method to increase the spacer etch resistance in …

Nanosphere Lithography And Its Application In Rapid And Economic Fabrication Of Plasmonic Hydrogenated Amorphous Silicon Photovoltaic Devices, Chenlong Zhang

Dissertations, Master's Theses and Master's Reports

Solar photovoltaic (PV) devices harvest energy from solar radiation and convert it to electricity. PV technologies, as an alternative to traditional fossil fuels, use clean and renewable energy while minimizing pollution. For decades researchers have been developing thin film solar cells as an important alternatives to the relatively expensive bulk crystal solar cell technology. Among those, hydrogenated amorphous silicon (a-Si:H) solar cells prevails for good efficiency, non-toxic and materially abundant nature. However, a-Si:H thickness must be minimized to prevent light induced degradation, so optical enhancement is necessary. Light manipulation has to be applied and carefully engineered to trap light within …

Investigation Of The Optical And Sensing Characteristics Of Nanoparticle Arrays For High Temperature Applications, Gnanaprakash Dharmalingam

Legacy Theses & Dissertations (2009 - 2024)

The monitoring of polluting gases such as CO and NOx emitted from gas turbines in power plants and aircraft is important in order to both reduce the effects of such gases on the environment as well as to optimize the performance of the respective power system. The need for emissions monitoring systems is further realized from increased regulatory requirements that are being instituted as a result of the environmental impact from increased air travel. Specifically, it is estimated that the contributions from aircraft emissions to total NOx emissions will increase from 4% to 17% between 2008 and 2020. Extensive fuel …

Patterning And Mechanical Analysis Of Fiber-Based Materials, Samuel A. Pendergraph

Doctoral Dissertations

The ability to define and control the topography of a surface has been studied extensively due to its importance in a wide variety of applications. The control of a non-planar topography would be very valuable since a number of structures that are pervasive in artificial applications (e.g. fibers, lenses) are curved interfaces. This potential of enabling applications that incorporate non-planar geometries was the motivation for this thesis. The first study of this thesis comprises the study of patterning the circumference of micrometer sized fibers. Specifically, a unique technique was described to pattern the fiber with a periodic array of colloids. …

2d & 3d Nanomaterial Fabrication With Biological Molecular Frameworks, Kristina Ivana Fabijanic

Dissertations, Theses, and Capstone Projects

Recently, there has been a heightened amount of work done in the field of biomineralization. By taking inspiration from natures' phenomenonal individualities as a means to develop new and interesting nanostructures of varying sizes and dimensions, there is a newly developed design, namely Biomimetic Crystallization Nanolithography (BCN). With this method, the simultaneous nano-patterning and crystallization has been achieved using urease as the nucleation point and the hydrolysis of urea to obtain patterns of oxide semiconductor material, namely zinc oxide, at room temperature and aqueous solvent. The new and interesting characteristic of BCN involves the construction of amorphous inks of ZnO …

Characterization Of Extreme Ultraviolet Lithography Photoresists Using Advanced Metrology And Fitting Techniques, Genevieve Kane

Legacy Theses & Dissertations (2009 - 2024)

As extreme ultraviolet lithography (EUVL) prepares to be incorporated into high volume manufacturing, many challenges must be addressed. Among these challenges, a need for photoresist improvement exists. The work described here will look into some of the problems and challenges facing EUV resists, in particular out-of-band (OOB) wavelengths of light and their interaction with photoresists. Studies have been completed on the effect of out-of-band light on photoresists [1]-[3]. It is imperative that solutions to suppress the deep ultraviolet (DUV) OOB light be incorporated into next generation EUV production tools due to concerns of decreased performance of lithography, and an increase …

Novel Resist Systems For Euv Lithography : Ler, Chain-Scission, Nanoparticle And More, Brian Cardineau

Legacy Theses & Dissertations (2009 - 2024)

Extreme Ultraviolet (EUV) lithography is currently the best option for replacing 193-nm lithography in future IC fabrication. For EUV to be successful, however, there are a number of challenges that must be overcome. Current resist designs struggle to meet the demands of future lithography nodes. We propose the best way to overcome these obstacles is through the design of novel resist systems.

The Effect Of Energy Deposition On Pattern Resolution In Electron Beam Lithography, Ananthan Raghunathan

Legacy Theses & Dissertations (2009 - 2024)

Electron beam lithography is one of the most important tools for nanofabrication. Electron beam lithography has consistently been able to offer higher resolution, typically better than 10 nm or so, compared to other techniques. In this work the contribution of electron-substrate interaction to pattern resolution is investigated.

Local Area Mask Patterning Of Extreme Ultraviolet Lithography Reticles For Native Defect Analysis, Adam Lyons

Legacy Theses & Dissertations (2009 - 2024)

Understanding the nature and behavior of native defects on EUV reticles, particularly their printability, is of critical importance to the successful implementation of EUV lithography for high volume manufacturing, as will be demonstrated in the upcoming chapters. Previous defect characterization work has focused on the examination of programmed defects, native defects on blank reticles, and unaligned native defects on patterned reticles. Each of these approaches has drawbacks, which will be discussed in detail, and the aim of this research is to address these deficiencies by developing a method to pattern features of interest over native defects, enabling the direct observation …

A Novel Fabrication Technique For Three-Dimensional Nanostructures, Ravi Kiran Bonam

Legacy Theses & Dissertations (2009 - 2024)

Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.

Evaluation Of Chemical Mechanical Planarization (Cmp) For The Removal Of Surface Defects In Extreme Ultraviolet Lithography (Euvl) Mask Substrates, Bradley Halligan Wood

Legacy Theses & Dissertations (2009 - 2024)

A modified CMP process was investigated and developed with the goal of removing surface defects (nanoscale depressions or `pits') from quartz mask blank substrates. Initially, quartz glass wafers were evaluated to observe surface roughness and defect introduction due to low down-force CMP processing. Following analysis of quartz glass wafers subjected to such processing it was determined that a CMP-based processing for pit removal of maskblank substrates was potentially viable. Consequently, a specially-designed mask carrier for investigating and developing CMP-based defect removal from EUV maskblank substrates was mounted on a Strasbaugh 6DS-SP CMP laboratory tool. A series of experiments was performed …

Cost-Effective Imprint Template Fabrication For Step And Flash Imprint Lithography, Adam Marc Munder

Legacy Theses & Dissertations (2009 - 2024)

The College of Nanoscale Science and Engineering (CNSE) is studying imprint template fabrication with the 100kV Vistec VB300 Gaussian E-Beam writer. The major goal is to develop and advance imprint template fabrication technology using low cost quartz wafers for proof-of-concept demonstrations.

Effects Of Radiation-Induced Carbon Contamination On The Printing Performance Of Extreme Ultraviolet Masks, Yu-Jen Fan

Legacy Theses & Dissertations (2009 - 2024)

This dissertation investigates one of the remaining issues for extreme ultraviolet (EUV) lithography, the effects of radiation induced carbon contamination on the printing performance of patterned EUV masks. The impact of carbon contamination on EUV masks is significant due to the throughput loss and potential effects on imaging performance, and occurs when multilayer surfaces are exposed to EUV radiation with residual carbonaceous species present. Current carbon contamination research is primarily focused on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on …

Fluorinated Acid Amplifiers For Extreme Ultraviolet Lithography, Seth Aaron Kruger

Legacy Theses & Dissertations (2009 - 2024)

Extreme ultraviolet lithography (EUV) is a promising candidate for next generation lithography. Although EUV has great potential there are still many challenges that must be solved before the technology can be implemented in the high volume manufacturing of semiconductor devices. The lithographic performance of EUV photoresists is one aspect that requires improvement. Particularly, EUV resists need simultaneous improvements in three properties: resolution, line-edge-roughness and sensitivity. The incorporation of acid amplifiers (AAs) in resists is one method to improve all three properties.

The Characterization And Analysis Of In-Vitro And Elevated Temperature Repassivation Of Ti-6al-4v Via Afm Techniques, Aaron J. Guerrero

Master's Theses

ABSTRACT

The Characterization and Analysis of In-vitro and Elevated Temperature Repassivation of

Ti-6Al-4V via AFM Techniques

Aaron J Guerrero

Research in the corrosion of orthopaedic implants is a growing research field where implants have been known to show adverse effects in patients who have encountered the unfortunate dissolution of their implants due to corrosion. Once corrosion begins within the body, many adverse biological reactions can occur such as late on-set infections resulting in severe health complications. The focus of this research is specifically related to the problem of late on-set infections caused by localized corrosion of orthopaedic implants. In medical …

A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan

Legacy Theses & Dissertations (2009 - 2024)

As the semiconductor industry continues scaling devices to smaller sizes, the need for next generation lithography technology for fabricating these small structures has always been at the forefront. Over the past few years, conventional optical lithography technology which has adopted a series of resolution enhancement techniques to support the scaling needs is expected to run out of steam in the near future. Extreme Ultra Violet lithography (EUVL) is being actively pursued by the semiconductor industry as one of the most promising next generation lithographic technologies. Most of the issues unique to EUVL arise from the use of 13.5 nm light …