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Full-Text Articles in Nanoscience and Nanotechnology

Patterning And Mechanical Analysis Of Fiber-Based Materials, Samuel A. Pendergraph Nov 2014

Patterning And Mechanical Analysis Of Fiber-Based Materials, Samuel A. Pendergraph

Doctoral Dissertations

The ability to define and control the topography of a surface has been studied extensively due to its importance in a wide variety of applications. The control of a non-planar topography would be very valuable since a number of structures that are pervasive in artificial applications (e.g. fibers, lenses) are curved interfaces. This potential of enabling applications that incorporate non-planar geometries was the motivation for this thesis. The first study of this thesis comprises the study of patterning the circumference of micrometer sized fibers. Specifically, a unique technique was described to pattern the fiber with a periodic array of colloids. …


Novel Resist Systems For Euv Lithography : Ler, Chain-Scission, Nanoparticle And More, Brian Cardineau Jan 2013

Novel Resist Systems For Euv Lithography : Ler, Chain-Scission, Nanoparticle And More, Brian Cardineau

Legacy Theses & Dissertations (2009 - 2024)

Extreme Ultraviolet (EUV) lithography is currently the best option for replacing 193-nm lithography in future IC fabrication. For EUV to be successful, however, there are a number of challenges that must be overcome. Current resist designs struggle to meet the demands of future lithography nodes. We propose the best way to overcome these obstacles is through the design of novel resist systems.


A Novel Fabrication Technique For Three-Dimensional Nanostructures, Ravi Kiran Bonam Jan 2012

A Novel Fabrication Technique For Three-Dimensional Nanostructures, Ravi Kiran Bonam

Legacy Theses & Dissertations (2009 - 2024)

Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.