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Full-Text Articles in Nanoscience and Nanotechnology
Patterning And Mechanical Analysis Of Fiber-Based Materials, Samuel A. Pendergraph
Patterning And Mechanical Analysis Of Fiber-Based Materials, Samuel A. Pendergraph
Doctoral Dissertations
The ability to define and control the topography of a surface has been studied extensively due to its importance in a wide variety of applications. The control of a non-planar topography would be very valuable since a number of structures that are pervasive in artificial applications (e.g. fibers, lenses) are curved interfaces. This potential of enabling applications that incorporate non-planar geometries was the motivation for this thesis. The first study of this thesis comprises the study of patterning the circumference of micrometer sized fibers. Specifically, a unique technique was described to pattern the fiber with a periodic array of colloids. …
2d & 3d Nanomaterial Fabrication With Biological Molecular Frameworks, Kristina Ivana Fabijanic
2d & 3d Nanomaterial Fabrication With Biological Molecular Frameworks, Kristina Ivana Fabijanic
Dissertations, Theses, and Capstone Projects
Recently, there has been a heightened amount of work done in the field of biomineralization. By taking inspiration from natures' phenomenonal individualities as a means to develop new and interesting nanostructures of varying sizes and dimensions, there is a newly developed design, namely Biomimetic Crystallization Nanolithography (BCN). With this method, the simultaneous nano-patterning and crystallization has been achieved using urease as the nucleation point and the hydrolysis of urea to obtain patterns of oxide semiconductor material, namely zinc oxide, at room temperature and aqueous solvent. The new and interesting characteristic of BCN involves the construction of amorphous inks of ZnO …
Characterization Of Extreme Ultraviolet Lithography Photoresists Using Advanced Metrology And Fitting Techniques, Genevieve Kane
Characterization Of Extreme Ultraviolet Lithography Photoresists Using Advanced Metrology And Fitting Techniques, Genevieve Kane
Legacy Theses & Dissertations (2009 - 2024)
As extreme ultraviolet lithography (EUVL) prepares to be incorporated into high volume manufacturing, many challenges must be addressed. Among these challenges, a need for photoresist improvement exists. The work described here will look into some of the problems and challenges facing EUV resists, in particular out-of-band (OOB) wavelengths of light and their interaction with photoresists. Studies have been completed on the effect of out-of-band light on photoresists [1]-[3]. It is imperative that solutions to suppress the deep ultraviolet (DUV) OOB light be incorporated into next generation EUV production tools due to concerns of decreased performance of lithography, and an increase …