Nanoscience and Nanotechnology Commons^™

Optical Angular Scatterometry: In-Line Approach For Roll-2-Roll And Nano-Imprint Fabrication Systems, Juan Jose Faria-Briceno

Electrical and Computer Engineering ETDs

As critical dimensions continue to shrink and structures become more complex, metrology processes are challenging to implement during in-line nanomanufacturing. Non-destructive, non-contact, and high-speed conditions are required to achieve proper metrology processes during in-line manufacturing. Optical scatterometry is a nanoscale metrology tool widely used in integrated circuit manufacturing for characterization and quality control. However, most applications of optical scatterometry operate off-line. A high-speed, in-line, non-contact, non-destructive scatterometry angular system has been demonstrated in this work to scan pattern surfaces during real-time nano-fabrication.

Our system has demonstrated scanning capabilities using flat, 1D and 2D complex structures. The flat surface samples consist …