Nanoscience and Nanotechnology Commons^™

Focused Electron Beam Induced Deposition Of Copper With High Resolution And Purity From Aqueous Solutions, Samaneh Esfandiarpour, Lindsay Boehme, J. Todd Hastings

Electrical and Computer Engineering Faculty Publications

Electron-beam induced deposition of high-purity copper nanostructures is desirable for nanoscale rapid prototyping, interconnection of chemically synthesized structures, and integrated circuit editing. However, metalorganic, gas-phase precursors for copper introduce high levels of carbon contamination. Here we demonstrate electron beam induced deposition of high-purity copper nanostructures from aqueous solutions of copper sulfate. The addition of sulfuric acid eliminates oxygen contamination from the deposit and produces a deposit with ~95 at% copper. The addition of sodium dodecyl sulfate (SDS), Triton X-100, or polyethylene glycole (PEG) improves pattern resolution and controls deposit morphology but leads to slightly reduced purity. High resolution nested lines …