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Effect Of Different Deposition Mediums On The Adhesion And Removal Of Particles, S. Hu, Tae-Hoon Kim, Jin-Goo Park, Ahmed A. Busnaina
Effect Of Different Deposition Mediums On The Adhesion And Removal Of Particles, S. Hu, Tae-Hoon Kim, Jin-Goo Park, Ahmed A. Busnaina
Jin-Goo Park
The purpose of this study is to investigate the effect of the different deposition mediums on the adhesion and removal of particles. Polystyrene latex (PSL) particles (50 µm) are deposited on thermal oxide and silicon nitride coated silicon wafers using different suspension mediums: air, isopropyl alcohol (IPA), and deionized water and then removed in a dry environment. The results show that PSL particles deposited on oxide are easier to remove than those on nitride due to a higher van der Waals force in all deposition mediums. In addition, dry particles deposited in air are much easier to remove than those …