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Full-Text Articles in Nanoscience and Nanotechnology
Large Coercivity In Nanostructured Rare-Earth-Free Mnₓga Films, Don Heiman, Tom Nummy, Steve Bennett, Tom Cardinal
Large Coercivity In Nanostructured Rare-Earth-Free Mnₓga Films, Don Heiman, Tom Nummy, Steve Bennett, Tom Cardinal
Donald Heiman
The magnetic hysteresis of MnₓGa films exhibit remarkably large coercive fields as high as μₒHC=2.5 T when fabricated with nanoscale particles of a suitable size and orientation. This coercivity is an order of magnitude larger than in well-ordered epitaxial film counterparts and bulk materials. The enhanced coercivity is attributed to the combination of large magnetocrystalline anisotropy and ~50-100 nm size nanoparticles. The large coercivity is also replicated in the electrical properties through the anomalous Hall effect. The magnitude of the coercivity approaches that found in rare-earth magnets, making them attractive for rare-earth-free magnet applications.
Analysis Of Scratches Formed On Oxide Surface During Chemical Mechanical Planarization, Jae-Gon Choi, Y. Prasad, In-Kwon Kim, In-Gon Kim, Woo-Jin Kim, Ahmed Busnaina, Jin-Goo Park
Analysis Of Scratches Formed On Oxide Surface During Chemical Mechanical Planarization, Jae-Gon Choi, Y. Prasad, In-Kwon Kim, In-Gon Kim, Woo-Jin Kim, Ahmed Busnaina, Jin-Goo Park
Jin-Goo Park
Scratch formation on patterned oxide wafers during the chemical mechanical planarization process was investigated. Silica and ceria slurries were used for polishing the experiments to observe the effect of abrasives on the scratch formation. Interlevel dielectric patterned wafers were used to study the scratch dimensions, and shallow trench isolation patterned wafers were used to study the effect of polishing parameters, such as pressure and rotational speed (head/platen). Similar shapes of scratches (chatter type) were observed with both types of slurries. The length of the scratch formed might be related to the period of contact between the wafer and the pad. …