Nanoscience and Nanotechnology Commons^™

Characterization Of Amino Acid Adlayers On Inas Surfaces Using X-Ray Photoelectron Spectroscopy, John Slavin, Upasana Jarori, Dmitry Zemlyanov, Albena Ivanisevic

Dmitry Yurievich Zemlyanov

Removal of surface oxide layers and the prevention of their reformation is an essential step in the use of Ill-V semiconductor technologies. Highlighted here are data exploring the use of amino acid (AA) self-assembled monolayers (SAMs) to block the pre-growth of oxides on indium arsenide surfaces. Three different AAs were used: lysine, aspartic acid, and cysteine. The adlayers were characterized by atomic force microscopy (AFM), Raman, and angle resolved X-ray photoelectron spectroscopy (ARXPS). AFM data suggest that the AA functional groups affect the packing and orientation of the molecules on the surfaces, reinforced by contact angle data. Raman data provide …