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Full-Text Articles in Nanoscience and Nanotechnology
Laser-Spark Multicharged Ion Implantation System ‒ Application In Ion Implantation And Neural Deposition Of Carbon In Nickel (111), Oguzhan Balki
Laser-Spark Multicharged Ion Implantation System ‒ Application In Ion Implantation And Neural Deposition Of Carbon In Nickel (111), Oguzhan Balki
Electrical & Computer Engineering Theses & Dissertations
Carbon ions generated by ablation of a carbon target using an Nd:YAG laser pulse (wavelength λ = 1064 nm, pulse width τ = 7 ns, and laser fluence of 10-110 J/cm2) are characterized. Time-of-flight analyzer, a three-mesh retarding field analyzer, and an electrostatic ion energy analyzer are used to study the charge and energy of carbon ions generated by laser ablation. The dependencies of the ion signal on the laser fluence, laser focal point position relative to target surface, and the acceleration voltage are described. Up to C4+ are observed. When no acceleration voltage is applied between …
Effect Of Ion Flux (Dose Rate) In Source-Drain Extension Ion Implantation For 10-Nm Node Finfet And Beyond On 300/450mm Platforms, Ming-Yi Shen
Legacy Theses & Dissertations (2009 - 2024)
The improvement of wafer equipment productivity has been a continuous effort of the semiconductor industry. Higher productivity implies lower product price, which economically drives more demand from the market. This is desired by the semiconductor manufacturing industry. By raising the ion beam current of the ion implanter for 300/450mm platforms, it is possible to increase the throughput of the ion implanter. The resulting dose rate can be comparable to the performance of conventional ion implanters or higher, depending on beam current and beam size. Thus, effects caused by higher dose rate must be investigated further. One of the major applications …