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Full-Text Articles in Mechanical Engineering
Structural And Mechanical Properties Of Nanostructured Tio2 Thin Films Deposited By Rf Sputtering
Structural And Mechanical Properties Of Nanostructured Tio2 Thin Films Deposited By Rf Sputtering
A.S. Md Abdul Haseeb
This study mainly aims to evaluate the effects of substrate temperatures on the mechanical properties of TiO2 thin films deposited on glass substrates by radio-frequency (RF) magnetron sputtering. All titania films possess anatase structure having a nodular morphology. AES results reveal that Si and Na ions from glass diffuse into TiO2 films at higher substrate temperatures. Micro-scratch and wear tests were conducted to evaluate their mechanical and tribological properties. The adhesion critical loads of TiO2 films deposited at room temperature, 200 and 300°C are found to be 1.51, 1.54 and 1.08N, respectively. Scratch hardness also increases from 11.5 to 13.6GPa …
Influence Of Ni Nanoparticle On The Morphology And Growth Of Interfacial Intermetallic Compounds Between
A.S. Md Abdul Haseeb
TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The structural and optical properties of the thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and ultraviolet-visible-near infrared (UV-VIS-NIR) spectrophotometry. XRD results show that as-grown and post-annealed TiO2 films have anatase crystal structure. Higher substrate and annealing temperatures result in a slight increase of crystallinity. TiO2 …
Influence Of Substrate Temperatures On Structural, Morphological And Optical Properties Of Rf-Sputtered Anatase Tio 2 Films
A.S. Md Abdul Haseeb
In this investigation, TiO 2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 °C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO 2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO 2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures …