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Full-Text Articles in Mechanical Engineering
Influence Of Ni Nanoparticle On The Morphology And Growth Of Interfacial Intermetallic Compounds Between
A.S. Md Abdul Haseeb
TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The structural and optical properties of the thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and ultraviolet-visible-near infrared (UV-VIS-NIR) spectrophotometry. XRD results show that as-grown and post-annealed TiO2 films have anatase crystal structure. Higher substrate and annealing temperatures result in a slight increase of crystallinity. TiO2 …
Investigations On Tio2 And Ag Based Single And Multilayer Films For Window Glazings
Investigations On Tio2 And Ag Based Single And Multilayer Films For Window Glazings
A.S. Md Abdul Haseeb
In this investigation, TiO2 and Ag based single and multilayer-films were deposited on microscope glass slides with varying individual layer thicknesses by radio-frequency reactive magnetron sputtering. Prior to multilayer development, single layers of Ag and TiO2 were deposited and characterized. All the films were prepared at an elevated pressure of 3 Pa at room temperature. It was found that single layer of TiO2 showed anatase polycrystalline structure. It also exhibited high visible transmittance of above 80% and higher refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gap of the TiO2 films was estimated as …
Influence Of Substrate Temperatures On Structural, Morphological And Optical Properties Of Rf-Sputtered Anatase Tio 2 Films
A.S. Md Abdul Haseeb
In this investigation, TiO 2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 °C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO 2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO 2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures …