Mechanical Engineering Commons^™

Modified Reactive Sputter Deposition Of Titanium Nitride Thin Films Via Hipims With Kick-Pulse And Improvement Of The Structure-Zone Model, Andrew Miceli

UNF Graduate Theses and Dissertations

Direct current (DC) and radio frequency (RF) sputtering methods have been commonplace in industry for several decades and widely studied in literature. Hard films of nitrides, such as titanium nitride (TiN), have been deposited using reactive DC sputtering onto cutting tools and medical devices extensively as well. For these applications, the films require excellent adhesion, high density, and high hardness. High-Power Impulse Magnetron Sputtering (HIPIMS) has emerged over the last several years as a method to produce films with increased density and mechanical properties. Process-structure-property relationships for reactive HIPIMS are not yet well developed. Additionally, conventional HIPIMS suffers from relatively …