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Articles 1 - 6 of 6
Full-Text Articles in Engineering Science and Materials
Process For The Formation Of Wear- And Scuff-Resistant Carbon Coatings, Gerard W. Malaczynski, Xiaohong Qiu, Joseph V. Mantese, Alaa A. Elmoursi, Aboud H. Hamdi, Blake P. Wood, Kevin C. Walter, Michael Nastasi
Process For The Formation Of Wear- And Scuff-Resistant Carbon Coatings, Gerard W. Malaczynski, Xiaohong Qiu, Joseph V. Mantese, Alaa A. Elmoursi, Aboud H. Hamdi, Blake P. Wood, Kevin C. Walter, Michael Nastasi
Department of Mechanical and Materials Engineering: Faculty Publications
A process for forming an adherent diamond-like carbon coating on a workpiece of suitable material such as an aluminum alloy is disclosed. The workpiece is successively immersed in different plasma atmospheres and subjected to short duration, high voltage, negative electrical potential pulses or constant negative electrical potentials or the like so as to clean the surface of oxygen atoms, implant carbon atoms into the surface of the alloy to form carbide com pounds while codepositing a carbonaceous layer on the surface, bombard and remove the carbonaceous layer, and to thereafter deposit a generally amorphous hydrogen-containing carbon layer on the surface …
Study On The Surface States Of Zinc Sulfide Thin Film Doped With Erbium And Their Effect On The Relaxation Luminance, Yujiang Wang, Zhaohong Liu, Zhenxiang Chen
Study On The Surface States Of Zinc Sulfide Thin Film Doped With Erbium And Their Effect On The Relaxation Luminance, Yujiang Wang, Zhaohong Liu, Zhenxiang Chen
Journal of Electrochemistry
X-ray photoelectron spectrum and characteristics of the capacity,versus thevoltage of the thin film devices are measured to study the surface states of the zinc sulfide thin film.The transient electroluminescence excited by pulses shows the relaxation luminance peaks during anon-exponential decay process of the characteristic transitions activated by Er￣(3+) in the ZnS directcurrent thin film electroluminescence (DCTFEL) devices.The surface structures of ZnS:Cu,Cl,Erfilm with the absorption of oxygen,and the effect of the surface states on the relaxation luminance ofthe devices are discussed.
Method Of Making Quasicrystal Alloy Powder, Protectivecoatings And Articles, Jeffrey E. Shield, Alan I. Goldman, Iver E. Anderson, Timothy W. Ellis, R. William Mccallum, Daniel J. Sordelet
Method Of Making Quasicrystal Alloy Powder, Protectivecoatings And Articles, Jeffrey E. Shield, Alan I. Goldman, Iver E. Anderson, Timothy W. Ellis, R. William Mccallum, Daniel J. Sordelet
Department of Mechanical and Materials Engineering: Faculty Publications
A method of making quasicrystalline alloy particulates wherein an alloy is superheated and the meltis atomized to form generally spherical alloy particulates free of mechanical fracture and exhibiting a predominantly quasicrystalline in the atomized condition structure. The particulates can be plasma sprayed to form a coating or consolidated to form an article of manufacture.
Transient Photocurrent Behavior Of Multiple Quantum Well Gaas/Al_Xga_(1-X)As Electrode, Liuyao Liuyao, Xurui Xiao, Liyuan Liyuan
Transient Photocurrent Behavior Of Multiple Quantum Well Gaas/Al_Xga_(1-X)As Electrode, Liuyao Liuyao, Xurui Xiao, Liyuan Liyuan
Journal of Electrochemistry
Transient photocurrents induced by short light pulses at lattice-matched multiplequantum well(MQW)GaAs/Al_(0.3)Ga_(0.7)As electredes were studied in the 1 ×10￣(-2)mol·dm￣(-3)ferrocene([Fc￣0]/[Fc)￣+]=9/1)-0.1 mol·dm￣(-3)tetrabutylammonium tetrafluoroborate acetonitrile solutionin order to examine the relaxation photoprocesses and to evaluate kinetic parameters of superlattice electrodes. GaAs/Al_(0.3)Ca_(0. 7)As MQW electrode consisting of 10 periods with each of GaAs well(5.3nm)and Al_(0. 3)Ga_(0. 7)As barrier(10nm)showed two pronounced and well-resolved peak structures located at 1.503 eV and 1.699 eV in the photocurrent spectrum,corresponding to the theoretical allowedexcitonic transitions(Δn=0) for heavy holes(H11,H22)in the quantum well respectively. Transient photocurrent spectra were measured by a monochromatic light pulse with 7 μs pulsewidth and 9 nJ·cm￣(-2) of …
The Electrode Process Of Y(Ⅲ)On Copper Electrode And Its Surface Metallizing, Chungen Zhou, Shuzhen Duan
The Electrode Process Of Y(Ⅲ)On Copper Electrode And Its Surface Metallizing, Chungen Zhou, Shuzhen Duan
Journal of Electrochemistry
The reduction of yttrium ion on copper electrode in NaCl-KCl-YCl_3 molten saltshas been investigated.The results indicate that the formation of intermetallic compounds is occuredbefore the metallic yttrium to be formed.The formation of intermetallic compounds is controlled bythe process of which yttrium atoms are diffusing into copper electrode.The kinetic characters todiffusion of yttrium atoms were also discussed.
Self Assembly Via Layer By Layer Surface Reaction On Gold Electrodes And The Electrochcmical Characterization, Xiandui Dong, Juntao Lu, Chuanxin Cha
Self Assembly Via Layer By Layer Surface Reaction On Gold Electrodes And The Electrochcmical Characterization, Xiandui Dong, Juntao Lu, Chuanxin Cha
Journal of Electrochemistry
The self-assembled monolayers,which were built by spontaneous adsorption of ω-carboxylic acid thiols on gold surface,were used as substrate for further modification through later bylayer amide surface reactions.At each stage of modification,the gold surface was characterizedelectochemieally. The results demonstrated that the strategies of layer by layer self assembly is ofsignificant potential for fabrieating functionalized ultrathin layers.