Open Access. Powered by Scholars. Published by Universities.®

Engineering Science and Materials Commons

Open Access. Powered by Scholars. Published by Universities.®

Articles 1 - 5 of 5

Full-Text Articles in Engineering Science and Materials

Correction Of Pattern Size Deviations In The Fabrication Of Photomasks Made With A Laser Direct-Writer, Ningzhi Xie, George Patrick Watson Oct 2019

Correction Of Pattern Size Deviations In The Fabrication Of Photomasks Made With A Laser Direct-Writer, Ningzhi Xie, George Patrick Watson

Protocols and Reports

When using Heidelberg DWL66+ laser writer to fabricate the photomask, the pattern feature dimensions may have deviations. These deviations can be caused by the lithography process and the undercut in the metal etch process. The same deviation value of 0.8µm was found to appear in all the patterns independent of the pattern original size and local pattern density. To overcome this universal deviation, a universal bias is suggested to be applied to the original patterns during the data preparation for the lithography process. In order to ensure this pre-exposure bias method can work, both the laser direct-write exposure conditions ...


Progress Report I: Fabrication Of Nanopores In Silicon Nitride Membranes Using Self-Assembly Of Ps-B-Pmma, Unnati Joshi, Vishal Venkatesh, Hiromichi Yamamoto Mar 2019

Progress Report I: Fabrication Of Nanopores In Silicon Nitride Membranes Using Self-Assembly Of Ps-B-Pmma, Unnati Joshi, Vishal Venkatesh, Hiromichi Yamamoto

Protocols and Reports

This progress report describes fabrication of silicon nitride membranes from Si wafers using cleanroom techniques, and of nanopore preparation via a self-assembled PS-b-PMMA film. A 36.9 µm thick membrane is successfully prepared by KOH wet etching. The membrane is a layered structure of 36.8 µm thick Si and 116 nm thick silicon nitride. It is also exhibited that in the 47 nm thick PS-b-PMMA film, the nanopore structure is observed in the vicinity of a dust particle, but most of the area indicates lamellar domain structure. The thickness of PS-b-PMMA film will ...


Inkjet Printing Of Ag Nanoparticles Using Dimatix Inkjet Printer, No 2, Ming Yuan Chuang May 2017

Inkjet Printing Of Ag Nanoparticles Using Dimatix Inkjet Printer, No 2, Ming Yuan Chuang

Protocols and Reports

This report describes the rheological analysisof the present Ag nanoparticle ink, and confirms that it is suitable for the piezoelectric drop-on-demand printing for both of 1 pL and 10 pL cartridges. The satellite drops and the splashing on the substrate are also discussed for optimization of the nozzle temperature and the jetting voltage. The minimum horizontal and vertical line widths are shown to be 30 and 40 µm, respectively, but the average minimum single line width is estimated to be ~50 µm. The non-uniform width lines are suggested to arise from the bulge instability. Furthermore, it is indicated that the ...


Inkjet Printing Of Ag Nanoparticles Using Dimatix Inkjet Printer, No 1, Amal Abbas, Inayat Bajwa Jan 2017

Inkjet Printing Of Ag Nanoparticles Using Dimatix Inkjet Printer, No 1, Amal Abbas, Inayat Bajwa

Protocols and Reports

Ag nanoparticle inkjet printing on polyimide and polyethylene terephthalate films has been performed using Dimatix inkjet printer at Quattrone Nanofabrication Facility. This article describes selection of Ag nanoparticle inks and reports the progress of optimization of drop spacing, drop frequency, droplet size, and waveform for high resolution features, and furthermore reveals the pros and cons of Dimatix inkjet printing. In addition, the resistivity of Ag nanoparticle line sintered was determined to be ~2.2 x 10-5 Ωm. The adhesion and bending tests indicated that Ag nanoparticle pattern sintered on PI and PET films had exceptional mechanical stability.


Self-Aligned Double Pattern, No1, Yinong Cao May 2016

Self-Aligned Double Pattern, No1, Yinong Cao

Protocols and Reports

No abstract provided.