Engineering Science and Materials Commons^™

Ultra-Violet Lithography Of Thick Photoresist For The Applications In Biomems And Micro Optics, Ren Yang

LSU Doctoral Dissertations

UV lithography of thick photoresist is widely used in microelectromechanical systems (MEMS) and micro-optoelectromechanical systems (MOEMS). SU-8 is a typical negative tone thick photoresist for micro systems, and can be used for both structural material and pattern transfer. This dissertation presents an effort to comprehensively study these important subjects. The first part, and the most fundamental part of this dissertation concentrated on the numerical analysis and experimental study of the wavelength dependent absorbance of SU-8 and the diffraction effects on the sidewall profiles of the microstructures made using UV lithography of SU-8. This study has laid the foundation for all …