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Full-Text Articles in Electrical and Computer Engineering
Method For Cleaning Phosphor Screens For Use With Field Emission Displays - Micron Technology Inc. (Boise, Id) - United States Patent 6409564, Jim Browning, Zhongyi Xia, David A. Cathey, Surjit S. Chadha
Method For Cleaning Phosphor Screens For Use With Field Emission Displays - Micron Technology Inc. (Boise, Id) - United States Patent 6409564, Jim Browning, Zhongyi Xia, David A. Cathey, Surjit S. Chadha
Jim Browning
A method for cleansing the phosphor screen of a display device comprising the removal of oxygen or sulfur from the surface of the phosphor, and/or its associated binder material, to a depth that prevents oxygen diffusion from the phosphor and/or binder, thereby creating an oxygen deficient surface on the phosphors.
Identifying And Disabling Shorted Electrodes In Field Emission Display - Micron Technology Inc. (Boise, Id) - United States Patent #6034480, Jim Browning, John K. Lee, Tyler A. Lowrey
Identifying And Disabling Shorted Electrodes In Field Emission Display - Micron Technology Inc. (Boise, Id) - United States Patent #6034480, Jim Browning, John K. Lee, Tyler A. Lowrey
Jim Browning
Methods and apparatus for identifying and disabling shorted electrode pairs (such as field emitter tip electrodes shorted to grid electrodes) in a field emission display by applying a test voltage across the two electrodes in each pair. The magnitude of the test voltage is set below the voltage required to initiate field emission from the emitter tip electrode. Because no field emission occurs at this voltage, the test voltage should produce no current flow through good (non-shorted) emitter tips. However, current will flow through emitter tips which are shorted to their respective grid electrodes. In one embodiment, the current flow …
Fabrication Of Field Emission Array With Vacuum Cathodic Arc Deposition - Micron Technology Inc. (Boise, Id) - United States Patent #6027619, David A. Cathey, Jim Browning, Zhong-Yi Xia
Fabrication Of Field Emission Array With Vacuum Cathodic Arc Deposition - Micron Technology Inc. (Boise, Id) - United States Patent #6027619, David A. Cathey, Jim Browning, Zhong-Yi Xia
Jim Browning
A filtered cathodic vacuum arc is used as a source of metal to generate a highly directional beam of metal ions having substantially larger velocity parallel to the axis of the beam (perpendicular to the surface of the target) than perpendicular to the axis of the beam. This ion beam, with energies ranging up to 80 cV, is used to deposit metal into the bottom of high aspect (typically greater than 3 to 1) openings, for example, to deposit titanium in the bottom of deep contact holes in semiconductor devices or to deposit molybdenum to form tips for emitters for …