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2000

Journal of the Microelectronic Engineering Conference

Anti-Reflective Micromechanical Modulator

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Process Development For An Anti-Reflective Micromechanical Modulator, Jason Neidrich Jan 2000

Process Development For An Anti-Reflective Micromechanical Modulator, Jason Neidrich

Journal of the Microelectronic Engineering Conference

The purpose of this Senior Design project is to design and develop the process for an Anti-Reflective Micromechanical Modulator at RIT’s facility, based on AT&T Bell Laboratories presented device, OFC ‘94). The device is fabricated using common semiconductor materials and is used to reflect a laser signal. There are 2 states of operation: the optically ON state, which reflects the signal, and the optically OFF state, which cancels the signal out through destructive interference. A three-layer mask process was designed on RIT’s IC Layout software, the levels being the Active, Metal, and Sacrificial Evacuation areas. The process steps include 4 …