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Managing Lithographic Variations In Design, Reliability, And Test Using Statistical Techniques, Aswin Sreedhar
Managing Lithographic Variations In Design, Reliability, And Test Using Statistical Techniques, Aswin Sreedhar
Open Access Dissertations
Much of today's high performance computing engines and hand-held mobile devices are products of aggressive CMOS scaling. Technology scaling in semiconductor industry is mainly driven by corresponding improvements in optical lithography technology. Photolithography, the art used to create patterns on the wafer is at the heart of the semiconductor manufacturing process. Lately, improvements in optical technology have been difficult and slow. The transition to deep ultra-violet (DUV) light source (193nm) required changes in lens materials, mask blanks, light source and photoresist. It took more than ten years to develop a stable chemically amplified resist (CAR) for DUV. Consequently, as the …