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Full-Text Articles in Engineering
Atomic Layer Deposited Pt/Tio2-Sio2 And Pt/Zro2-Sio2 For Sequential Adsorption And Oxidation Of Vocs, Busuyi O. Adebayo, Han Yu, Ali A. Rownaghi, Xinhua Liang, Fateme Rezaei
Atomic Layer Deposited Pt/Tio2-Sio2 And Pt/Zro2-Sio2 For Sequential Adsorption And Oxidation Of Vocs, Busuyi O. Adebayo, Han Yu, Ali A. Rownaghi, Xinhua Liang, Fateme Rezaei
Chemical and Biochemical Engineering Faculty Research & Creative Works
In this work, Pt nanoparticles were loaded on SiO2, TiO2-thin-film-modified SiO2 (TiO2-SiO2), or ZrO2-thin-film-modified SiO2 (ZrO2-SiO2) particles and the composites were investigated for sequential adsorption and desorption/catalytic oxidation of benzene. The SiO2 was prepared via sol–gel method, while TiO2-SiO2 and ZrO2-SiO2 were synthesized via atomic layer deposition (ALD) thin film coating of TiO2 or ZrO2 on SiO2 particles substrate. In the sequential capture-reaction tests, the materials were first exposed to ca. 500 ppmv benzene …
Supercritical-Carbon Dioxide-Assisted Cyclic Deposition Of Metal Oxide And Metal Thin Films, Dipak Barua, Theodosia Gougousi, Erin D. Young, Gregory N. Parsons
Supercritical-Carbon Dioxide-Assisted Cyclic Deposition Of Metal Oxide And Metal Thin Films, Dipak Barua, Theodosia Gougousi, Erin D. Young, Gregory N. Parsons
Chemical and Biochemical Engineering Faculty Research & Creative Works
Thin films of aluminum oxide and palladium were deposited on silicon at low temperatures (70-120 °C) by a cyclic adsorption/reaction processes using supercritical CO2 solvent. Precursors included Al(hfac)3, Al(acac)3, and Pd(hfac)2, and aqueous H2O2, tert-butyl peracetate, and H2 were used as the oxidants or reductants. For the precursors studied, growth proceeds through a multilayer precursor adsorption in each deposition cycle, and film thickness increased linearly with the number of growth cycles.