Engineering Commons^™

Rotating Scatter Mask Optimization For Gamma Source Direction Identification, Darren E. Holland, James E. Blevins, Larry W. Burggraf, Buckley E. O'Day

Engineering and Computer Science Faculty Publications

Rotating scattering masks have shown promise as an inexpensive, lightweight method with a large field-of-view for identifying the direction of a gamma emitting source or sources. However, further examination of the current rotating scattering mask design shows that changing the geometry may improve the identification by reducing or eliminating degenerate solutions and lower required count times. These changes should produce more linearly independent characteristics for the mask, resulting in a decrease in the mis-identification probability. Three approaches are introduced to generate alternative mask geometries. The eigenvector method uses a spring–mass system to create a geometry basis. The binary approach uses …