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Modification Of Semi-Metal Oxide And Metal Oxide Powders By Atomic Layer Deposition Of Thin Films, Mark Q. Snyder
Modification Of Semi-Metal Oxide And Metal Oxide Powders By Atomic Layer Deposition Of Thin Films, Mark Q. Snyder
Electronic Theses and Dissertations
This work describes two methods of modifying, and the subsequent characterizing of, oxide nanopowders. The first method, atomic layer deposition, or ALD, is a series of surface-limited reactions that are repeated to deposit a thin, inorganic film on the surface of the nanopowder. Deposition of a thin film is a useful method to alter the surface properties of a material while retaining its bulk properties. Part of this thesis concerns the understanding of the growth mechanism of thin film titanium nitride (a material known for thermal and chemical stability as well as electronic conductivity) on silica through the ALD process. …
Platinum/Silica Thin Films By Chemical Vapor Deposition, Tyler Philip Martin
Platinum/Silica Thin Films By Chemical Vapor Deposition, Tyler Philip Martin
Electronic Theses and Dissertations
Composite thin films consisting of platinum and silica (SiO)2 have been fabricated by chemical vapor deposition (CVD). These films were studied for possible future use in enhancing the selectivity of sensors for the chemical warfare agent sarin. Chemical vapor deposition is a thin film growth technique in which precursor molecules are carried into a reactor and decomposed, often at high temperature, to produce a thin solid film. A new cold wall CVD reactor was built for this work. The platinum precursor used in this work was platinum acetylacetonate [Pt(acac)2] and the silica precursor was tetraethoxysilane (TEOS). It …
Stabilization Of Rutile-Related Thin Film On Tio2 Substrates, Youngnam Cho
Stabilization Of Rutile-Related Thin Film On Tio2 Substrates, Youngnam Cho
Electronic Theses and Dissertations
Conducting metal oxide thin films are of broad interest because they have a wide variety of magnetic and electronic properties. Materials exist that range from superconducting to insulating, are ferromagnetic and are ferroelectric. These properties make thin conducting oxide films attractive for many industrial applications. A class of metal oxides exists that adapt the rutile crystal structure; the structure of the mineral rutile, TiO2. These metal oxides have the general formula MO2 where M is a metal cation of valence +4. Metal oxides crystallizing in the rutile structure also display a wide variety of physical properties. The …