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Full-Text Articles in Physical Sciences and Mathematics
Measurement Of Proton Transfer Reaction Rates In A Microwave Cavity Discharge Flowing Afterglow, George M. Brooke Iv
Measurement Of Proton Transfer Reaction Rates In A Microwave Cavity Discharge Flowing Afterglow, George M. Brooke Iv
Physics Theses & Dissertations
The reaction rate coefficients between the hydronium ion and the molecules ethene (C2H4), propene (C3H6), 1-butene (C4H8) and hydrogen sulfide (H2S) were measured at 296 K. The measured reaction rates were compared to collision rates calculated using average dipole orientation (ADO) theory. Reaction efficiency depends primarily upon the proton affinity of the molecules. All the measurements were obtained using the newly developed microwave cavity discharge flowing afterglow (MCD-FA) apparatus. This device uses an Asmussen-type microwave cavity discharge ion source that is …
Argon Eximer Emission From High-Pressure Microdischarges In Mental Capillaries, R. Mohan Sankaran, Konstantinos P. Giapis, Mohamed Moselhy, Karl H. Schoenbach
Argon Eximer Emission From High-Pressure Microdischarges In Mental Capillaries, R. Mohan Sankaran, Konstantinos P. Giapis, Mohamed Moselhy, Karl H. Schoenbach
Bioelectrics Publications
We report on argon excimer emission from high-pressure microdischarges formed inside metal capillaries with or without gas flow. Excimer emission intensity from a single tube increases linearly with gas pressure between 400 and 1000 Torr. Higher discharge current also results in initial intensity gains until gas heating causes saturation or intensity drop. Argon flow through the discharge intensifies emission perhaps by gas cooling. Emission intensity was found to be additive in prealigned dual microdischarges, suggesting that an array of microdischarges could produce a high-intensity excimer source.
Comparison Between The Ultraviolet Emission From Pulsed Microhollow Cathode Discharges In Xenon And Argon, Isfried Petzenhauser, Leopold D. Biborosch, Uwe Ernst, Klaus Frank, Karl H. Schoenbach
Comparison Between The Ultraviolet Emission From Pulsed Microhollow Cathode Discharges In Xenon And Argon, Isfried Petzenhauser, Leopold D. Biborosch, Uwe Ernst, Klaus Frank, Karl H. Schoenbach
Bioelectrics Publications
We measured the dynamic I–V characteristics and vacuum ultraviolet (VUV) emission lines of the second continuum in xenon (170 nm) and argon (130.5 nm) from pulsed microhollow cathode discharges (MHCD). For pulse lengths between 1 and 100 μs the dynamic I–V characteristics are similar in both inert gases. Only the time variation of the VUV emission line at 170 nm for xenon can be related to the dimer excited states. In argon the energy transfer between the Ar*2 dimers and the oxygen impurity atoms is responsible for a qualitatively different time behavior of the resonance line at 130.5 nm. …
Chemical Vapor Deposited Diamond Films For Self-Referencing Fiber Optic Raman Probes, Sacharia Albin, Jianli Zheng, Bing Xiao, John B. Cooper, Robert B. Jeffers, Sonia Antony
Chemical Vapor Deposited Diamond Films For Self-Referencing Fiber Optic Raman Probes, Sacharia Albin, Jianli Zheng, Bing Xiao, John B. Cooper, Robert B. Jeffers, Sonia Antony
Chemistry & Biochemistry Faculty Publications
Diamond thin films grown by the microwave plasma enhances chemical vapor deposition (CVD) process have been investigated as an internal reference in fiber optic remote Raman sensing. The growth parameters have been optimized for diamond thin films on quarts substrates using a gas mixture of methane, carbon dioxide, and hydrogen. The resulting films exhibit essentially no Raman spectral background while exhibiting a strong Raman peak at 1332 cm-¹. The films are used as an internal reference in the quantitative measurement of chemical concentration using remote fiber optic Raman sensing. Internal referencing is accomplished by normalizing all spectral intensities …