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Full-Text Articles in Physical Sciences and Mathematics
Effect Of Ammonia Flow Rate On Impurity Incorporation And Material Properties Of Si-Doped Gan Epitaxial Films Grown By Reactive Molecular Beam Epitaxy, Wook Kim, A. E. Botchkarev, H. Morkoç, Z-Q. Fang, David C. Look, David J. Smith
Effect Of Ammonia Flow Rate On Impurity Incorporation And Material Properties Of Si-Doped Gan Epitaxial Films Grown By Reactive Molecular Beam Epitaxy, Wook Kim, A. E. Botchkarev, H. Morkoç, Z-Q. Fang, David C. Look, David J. Smith
Physics Faculty Publications
Effect of ammonia flow rate on the impurity incorporation and material properties of Si-doped GaN films grown by reactive molecular beam epitaxy (RMBE) process is discussed. It appears that the ammonia flow rate has a marginal effect on the incorporation of impurities into the Si-doped GaN films except there was a little decrease in O and Si with increasing ammonia flow rate when the Si concentration in the film is higher than 1018 cm−3. Electron Hall mobility of Si-doped GaN films grown by RMBE varies with ammonia flow rate used during film growth. From deep level transient …
Deep Centers In N-Gan Grown By Reactive Molecular Beam Epitaxy, Z-Q. Fang, David C. Look, W. Kim, Z. Fan, A. Botchkarev, H. Morkoç
Deep Centers In N-Gan Grown By Reactive Molecular Beam Epitaxy, Z-Q. Fang, David C. Look, W. Kim, Z. Fan, A. Botchkarev, H. Morkoç
Physics Faculty Publications
Deep centers in Si-doped n-GaN layers grown by reactive molecular beam epitaxy have been studied by deep-level transient spectroscopy as a function of growth conditions. Si-doped GaN samples grown on a Si-doped n+-GaN contact layer at 800 °C show a dominant trap C1 with activation energy ET = 0.44 eV and capture cross-section σT = 1.3×10−15 cm−2, while samples grown at 750 °C on an undoped semi-insulating GaN buffer show prominent traps D1 and E1, with ET = 0.20 eV and σT = 8.4×10−17 cm …
High Mobility Algan/Gan Heterostructures Grown By Gas-Source Molecular Beam Epitaxy, L. K. Li, J. Alperin, W. I. Wang, David C. Look, Donald C. Reynolds
High Mobility Algan/Gan Heterostructures Grown By Gas-Source Molecular Beam Epitaxy, L. K. Li, J. Alperin, W. I. Wang, David C. Look, Donald C. Reynolds
Physics Faculty Publications
We report on the growth of high electron mobility AlGaN/GaN heterostructures on sapphire substrates by gas-source molecular beam epitaxy (GSMBE) using ammonia as the nitrogen source. Improvements in structural, electrical, and optical properties of GaN and AlGaN layers have been made to achieve this goal. For the growth of AlGaN layers, the reflection high-energy electron diffraction revealed a twofold surface reconstruction, indicative of atomic smoothness of the film surface. High mobility two-dimensional electron gas has been achieved in both unintentionally doped (by piezoelectric effect induced by lattice mismatch strain) and modulation doped AlGaN/GaN heterostructures. The modulation-doped n+-Al0.2Ga …
Neutral-Donor-Bound-Exciton Complexes In Zno Crystals, D. C. Reynolds, David C. Look, B. Jogai, C. W. Litton, T. C. Collins, W. C. Harsch, G. Cantwell
Neutral-Donor-Bound-Exciton Complexes In Zno Crystals, D. C. Reynolds, David C. Look, B. Jogai, C. W. Litton, T. C. Collins, W. C. Harsch, G. Cantwell
Physics Faculty Publications
Neutral-donor–bound-exciton transitions have been observed in ZnO. The isolated neutral donors are made up of defect pair complexes. The neutral-donor nature of these pair complexes was determined from magneticfield measurements and from two-electron transitions. Excited states of the neutral-donor bound excitons were observed in the form of rotator states analogous to rotational states of the H2 molecule.
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Physics Faculty Publications
Deep-level transient spectroscopy measurements of n-type GaN epitaxial layers irradiated with 1-MeV electrons reveal an irradiation-induced electron trap at EC−0.18 eV. The production rate is approximately 0.2 cm−1, lower than the rate of 1 cm−1 found for the N vacancy by Hall-effect studies. The defect trap cannot be firmly identified at this time. ©1998 American Institute of Physics.
Solar Cycle Variability Of Hot Oxygen Atoms At Mars, Jhoon Kim, Andrew F. Nagy, Jane L. Fox, Thomas E. Cravens
Solar Cycle Variability Of Hot Oxygen Atoms At Mars, Jhoon Kim, Andrew F. Nagy, Jane L. Fox, Thomas E. Cravens
Physics Faculty Publications
The population of hot oxygen atoms in the Martian exosphere is reexamined using newly calculated hot O production rates for both low and high solar cycle conditions. The hot oxygen production rates are assumed to result from the dissociative recombination of O2+ ions. These calculations take into account the calculated vibrational distribution of O2+ and the new measured branching ratios. Furthermore, these calculations also consider the variation of the dissociative recombination cross section with the relative speed of the participating ions and electrons, the rotational energy of the O2+ ions, and the spread of …
Effect Of High-Temperature Annealing On Electrical And Optical Properties Of Undoped Semi-Insulating Gaas, Z-Q. Fang, D. C. Reynolds, David C. Look, N. G. Paraskevopoulos, T. E. Anderson, R. L. Jones
Effect Of High-Temperature Annealing On Electrical And Optical Properties Of Undoped Semi-Insulating Gaas, Z-Q. Fang, D. C. Reynolds, David C. Look, N. G. Paraskevopoulos, T. E. Anderson, R. L. Jones
Physics Faculty Publications
A comprehensive characterization, including room temperature Hall effect, near infrared absorption, temperature dependent dark current and photocurrent (using 1.13 eV light), normalized thermally stimulated current (NTSC), photoluminescence at 4.2 K in both near band edge and deep level regions, and selective pair photoluminescence (SPL) at 2 K, has been carried out on undoped semi-insulating GaAs samples, cut from four wafers which were grown by the low pressure liquid encapsulated Czochralski technique and annealed by three different schedules: a 1100 °C anneal with either fast or slow cooling, or a 1000 °C standard anneal. The 1100 °C anneal clearly introduces higher …