Open Access. Powered by Scholars. Published by Universities.®
Physical Sciences and Mathematics Commons™
Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 2 of 2
Full-Text Articles in Physical Sciences and Mathematics
Simulation Of Fractal Growth On Metal Wire Electrode, Li-Feng Ding, Pei-Yuan Mao, Jun Cheng, Yu-Lan Niu, Yu-Hao Wen, Wei Chen
Simulation Of Fractal Growth On Metal Wire Electrode, Li-Feng Ding, Pei-Yuan Mao, Jun Cheng, Yu-Lan Niu, Yu-Hao Wen, Wei Chen
Journal of Electrochemistry
During processes of metal electrodepostion, there exist many complex morphological forms such as dendritic growing in the cathode deposited metal edge, which will seriously affect the quality of the electrodeposited product and current efficiency during machining. Investigations on dendritic crystal growing process and morphology could help controlling growth of electrolysis precipitate. In this work, Python and Matlab softwares were used, and the model of parallel electrode electrodeposition was established based on the diffusion-limited aggregation (DLA) model. By analyzing the law of fractal growth at different conditions of the particles number, probability, electrode spacing, the movement step length and orientation drift, …
Formation Of Copper Microcrystals On Porous Silicon Films, Lan-Li Chen, Fu-Fang Zhou, Bao-Gai Zhai, Yuan-Ming Huang
Formation Of Copper Microcrystals On Porous Silicon Films, Lan-Li Chen, Fu-Fang Zhou, Bao-Gai Zhai, Yuan-Ming Huang
Journal of Electrochemistry
Microcrystals of metallic copper were electrochemically deposited onto the surface of porous silicon films in the aqueous electrolyte of copper(II) chloride.The microstructures of electrochemically deposited copper microcrystals on the porous silicon films were characterized by using scanning electron microscopy.The results have demonstrated that both center-hollowed and center-solid equilateral triangles in the sizes of several micrometers can be formed on the smooth bed of copper microcrystals.As the deposition duration increased from 0 to 28 hours,the fractal dimensions of the porous silicon was decreased from 2.608 to 2.252,suggesting that the electrochemical deposition can smooth the rough surface of porous silicon films.Compared to …