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- Porous silicon (2)
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- Density of states (1)
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- Fused filament fabrication (1)
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- Low-load metal-assisted catalytic etching (MACE) (1)
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Articles 1 - 5 of 5
Full-Text Articles in Physical Sciences and Mathematics
Soft Ion Sputtering Of Pani Studied By Xps, Afm, Tof-Sims, And Sts, Christopher M. Goodwin, Zachary E. Voras, Xiao Tong, Thomas P. Beebe, Jr.
Soft Ion Sputtering Of Pani Studied By Xps, Afm, Tof-Sims, And Sts, Christopher M. Goodwin, Zachary E. Voras, Xiao Tong, Thomas P. Beebe, Jr.
Chemistry Faculty Publications
Herein is a study of the soft sputtering method, gas cluster ion sputtering (GCIS), and its effects on the atomic, morphologic, and band structure properties of polyaniline (PAni) as studied with X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry, atomic force microscopy, and scanning tunneling spectroscopy (STS). The GCIS source used was a 1000 argon atom cluster with 4 keV energy, which resulted in a sputter yield of 3.4 ± 0.2 × 10−3 nm3 per argon atom. Soft ion sputtering reduced the sample by explicitly removing the oxidized contaminants as determined by surface sensitive techniques: XPS and Time-of-flight secondary …
Low-Load Metal-Assisted Catalytic Etching Produces Scalable Porosity In Si Powders, Konstantin Tamarov, Riku Kiviluoto, Josph D. Swanson, Bret A. Unger, Alexis T. Ernst, Mark Aindow, Joakim Riikonen, Vesa-Pekka Lehto, Kurt W. Kolasinski
Low-Load Metal-Assisted Catalytic Etching Produces Scalable Porosity In Si Powders, Konstantin Tamarov, Riku Kiviluoto, Josph D. Swanson, Bret A. Unger, Alexis T. Ernst, Mark Aindow, Joakim Riikonen, Vesa-Pekka Lehto, Kurt W. Kolasinski
Chemistry Faculty Publications
The recently discovered low-load metal-assisted catalytic etching (LL-MACE) creates nanostructured Si with controllable and variable characteristics that distinguish this technique from the conventional high-load variant. LL-MACE employs 150 times less metal catalyst and produces porous Si instead of Si nanowires. In this work, we demonstrate that some of the features of LL-MACE cannot be explained by the present understanding of MACE. With mechanistic insight derived from extensive experimentation, it is demonstrated that (1) the method allows the use of not only Ag, Pd, Pt, and Au as metal catalysts but also Cu and (2) judicious combinations of process parameters such …
Response Of Photoluminescence Of H-Terminated And Hydrosilylated Porous Si Powders To Rinsing And Temperature, Kurt W. Kolasinski, Joseph D. Swanson, Benjamin Roe, Teresa Lee
Response Of Photoluminescence Of H-Terminated And Hydrosilylated Porous Si Powders To Rinsing And Temperature, Kurt W. Kolasinski, Joseph D. Swanson, Benjamin Roe, Teresa Lee
Chemistry Faculty Publications
The photoluminescence (PL) response of porous Si has potential applications in a number of sensor and bioimaging techniques. However, many questions still remain regarding how to stabilize and enhance the PL signal, as well as how PL responds to environmental factors. Regenerative electroless etching (ReEtching) was used to produce photoluminescent porous Si directly from Si powder. As etched, the material was H-terminated. The intensity and peak wavelength were greatly aected by the rinsing protocol employed. The highest intensity and bluest PL were obtained when dilute HCl(aq) rinsing was followed by pentane wetting and vacuum oven drying. Roughly half of the …
Regenerative Electroless Etching (U.S. Patent), Kurt W. Kolasinski, Jarno Salonen, Ermei Makila
Regenerative Electroless Etching (U.S. Patent), Kurt W. Kolasinski, Jarno Salonen, Ermei Makila
Chemistry Faculty Publications
A regenerative electroless etching process produces nanostructured semiconductors in which an oxidant (Ox 1 ) is used as a catalytic agent to facilitate reaction between a semiconductor and a second oxidant (Ox2) that would be unreactive (or slowly reactive compared to Ox 1 ) in the primary reaction. Ox2 is used to regenerate Ox1 , which can initiate etching by injecting holes into the semiconductor valence band. The extent of reaction is controlled by the amount of Ox2 added; the reaction rate, by the injection rate of Ox2 . This general strategy is demonstrated specifically to produce highly luminescent nanocrystalline …
Fabrication Of A 3d Printed Porous Junction For Ag|Agcl|Gel-Kcl Reference Electrode, Sarah May Sibug-Torres, Lance P. Go, Erwin Enriquez
Fabrication Of A 3d Printed Porous Junction For Ag|Agcl|Gel-Kcl Reference Electrode, Sarah May Sibug-Torres, Lance P. Go, Erwin Enriquez
Chemistry Faculty Publications
Fused filament fabrication (FFF) is a 3D printing method that is attracting increased interest in the development of miniaturized electrochemical sensor systems due to its versatility, low cost, reproducibility, and capability for rapid prototyping. A key component of miniaturized electrochemical systems is the reference electrode (RE). However, reports of the fabrication of a true 3D-printed RE that exhibits stability to variations in the sample matrix remain limited. In this work, we report the development and characterization of a 3D-printed Ag|AgCl|gel-KCl reference electrode (3D-RE). The RE was constructed using a Ag|AgCl wire and agar-KCl layer housed in a watertight 3D-printed acrylonitrile …