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Full-Text Articles in Physical Sciences and Mathematics
Electron Transfer During Metal-Assisted And Stain Etching Of Silicon, Kurt W. Kolasinski
Electron Transfer During Metal-Assisted And Stain Etching Of Silicon, Kurt W. Kolasinski
Chemistry Faculty Publications
The etching of silicon in fluoride solutions is limited by the kinetics of charge transfer not thermodynamics. This characteristic is what gives fluoride etching its great versatility in making different types of nanostructures as the result of self-limiting chemistry. This review approaches the kinetics of electron transfer from silicon and metal coated silicon to a solution phase species from a fundamental point of view in order to establish a better understanding of the mechanisms of nanostructure formation during metal assisted and stain etching of silicon. Band bending calculations demonstrate that diffusion of holes away from low work function metals such …
Synthesis And Flammability Testing Of Epoxy Functionalized Phosphorous-Based Flame Retardants, Vladimir Benin, Xuemei Cui, Alexander Morgan, Karl Seiwert
Synthesis And Flammability Testing Of Epoxy Functionalized Phosphorous-Based Flame Retardants, Vladimir Benin, Xuemei Cui, Alexander Morgan, Karl Seiwert
Chemistry Faculty Publications
Several potential new phosphorus-containing flame retardant molecules were evaluated for heat release reduction potential by incorporation of the molecules into a polyurethane, generated from methylene diphenyl diisocyanate and 1,3-propane diol. The heat release reduction potential of these substances was evaluated using the pyrolysis combustion flow calorimeter (PCFC). The polyurethanes were prepared in the presence of the potential flame retardants via solvent mixing and copolymerization methods to qualitatively evaluate their potential reactivity into the polyurethane prior to heat release testing. The functionality of the flame retardants was epoxide based that would potentially react with the diol during polyurethane synthesis. Flammability testing …
The Stoichiometry Of Metal Assisted Etching (Mae) Of Si In V2o5 + Hf And Hooh + Hf Solutions, Kurt W. Kolasinski, William B. Barclay, Yu Sun, Mark Aindow
The Stoichiometry Of Metal Assisted Etching (Mae) Of Si In V2o5 + Hf And Hooh + Hf Solutions, Kurt W. Kolasinski, William B. Barclay, Yu Sun, Mark Aindow
Chemistry Faculty Publications
No abstract provided.
Porous Layers Composed Of Oxide Crystallites Formed By The Combination Of Laser Ablation And Anodization Of Metal, Abbie S. Ganas, Dmitry A. Znamensky, Nahúm Méndez Alba, José Luis Hernández-Pozos, Kurt W. Kolasinski
Porous Layers Composed Of Oxide Crystallites Formed By The Combination Of Laser Ablation And Anodization Of Metal, Abbie S. Ganas, Dmitry A. Znamensky, Nahúm Méndez Alba, José Luis Hernández-Pozos, Kurt W. Kolasinski
Chemistry Faculty Publications
No abstract provided.