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Full-Text Articles in Physical Sciences and Mathematics
Nanomechanical And Morphological Characterization Of Tungsten Trioxide (Wo3) Thin Films Grown By Atomic Layer Deposition, M. A. Mamun, K. Zhang, H. Baumgart, A. A. Elmustafa
Nanomechanical And Morphological Characterization Of Tungsten Trioxide (Wo3) Thin Films Grown By Atomic Layer Deposition, M. A. Mamun, K. Zhang, H. Baumgart, A. A. Elmustafa
Mechanical & Aerospace Engineering Faculty Publications
This study investigates the nanomechanical properties and surface morphology of tungsten oxide WO3thin films deposited on p-type Si(100) substrates using atomic layer deposition (ALD) technology with 2000 ALD deposition cycles at a growth temperature of 300°C and annealed at different temperatures. The samples were further furnace annealed at 500, 600 and 700°C for 60 min. The influence of the deposition process on the structure and properties of the WO3 films is discussed, presented and correlated to the characteristic features of the ALD technique. The results depict significant difference in the hardness and modulus measurements between the as …