Physical Sciences and Mathematics Commons^™

Synthesis Of Molybdenum Containing Thin Films Using Organic Reducing Agents And Synthesis Of Magnesium Silyl Intermediate Complexes For Use In Atomic Layer Deposition, Michael David Overbeek

Wayne State University Dissertations

Thin films of a variety of materials have shown great potential in the fields of microelectronics, catalysis, and energy applications. Vapor deposition methods, including PVD and CVD, have been traditionally used as the primary method to deposit these thin films. However, these methods do not provide the necessary thickness uniformity and conformality needed for future uses of these thin films as they shrink to smaller dimensions. ALD provides a high degree of uniformity and conformality due to the intrinsic nature of the self-limited reaction mechanism of an ALD process.

The research herein focuses on two metals that have untapped potential …