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Precursors For Copper Chemical Vapor Deposition, Muna Bufaroosha
Precursors For Copper Chemical Vapor Deposition, Muna Bufaroosha
LSU Doctoral Dissertations
The main objective of this study was to synthesize precursors that are capable of producing copper films of high quality by chemical vapor deposition (CVD). We investigated some copper(I) and copper(II) complexes as precursors for chemical or photochemical vapor deposition. In chapter 2, we synthesized a series of Cu(hfac)2(amine) adducts, where hfac- is hexafluoroacetylacetonate and the amines are: dimethylamine, isopropylamine, allylamine, pyrrolidine, and piperidine. The efficiency of these adducts compared to Cu(hfac)2(H2O) as Cu-CVD precursors was examined under hydrogen. We found that among these amine adducts, Cu(hfac)2(allylamine)2 gave the best …