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Antireflective Surface Of Nanostructures Fabricated By Cf4 Plasma Etching, W Somrang, S Denchitcharoen, P Eiamchai, M Horprathum, C Chananonnawathorn

Journal of Metals, Materials and Minerals

In this research, the nanostructures surface were fabricated by the CF4 plasma etching process on the SiO2-based substrates for antireflection applications. The nickel films were firstly deposited on the substrates by the sputtering system. The prepared Ni layers were then annealed at 500°C for 1 minute in order to promote dewetting process to be used as metal masks. During the etching process, CF4 etching condition was performed for 15-60 min to create the SiO2 nanopillars. After the etching process, the samples were immersed in nitric acid for 5 min to remove the nickel masks. The SiO2 nanopillars without Ni were …