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Titanium Nitride As An Electrode Material For High Charge Density Applications, Mustafa Khan Patan
Titanium Nitride As An Electrode Material For High Charge Density Applications, Mustafa Khan Patan
Theses
Present day neural prostheses require electrodes with high current densities. Traditional electrodes are not capable of delivering such high current densities. Titanium nitride as an electrode material and other techniques like reactive ion etching, platinization of titanium were studied in this thesis towards improving charge density of electrodes.
Titanium nitride (TiN) was sputtered in a custom designed pattern of electrodes with silicon as substrate, at a deposition rate of 2 A /sec. Atomic Force Microscopy (AFM) analysis of TiN film showed a smooth surface for a film thickness of 1 μm. X-Ray Diffraction (XRD) analysis of the film showed the …