Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 2 of 2
Full-Text Articles in Engineering
Study Of Demolding Process In Thermal Imprint Lithography Via Numerical Simulation And Experimental Approaches, Zhichao Song
Study Of Demolding Process In Thermal Imprint Lithography Via Numerical Simulation And Experimental Approaches, Zhichao Song
LSU Master's Theses
The objective of present study was to analyze the mechanical behavior of polymer resist during the demolding process, such as stress distribution and evolution; distortion and tilt of microstructures in thermal imprint lithography, a new emerging technique in mass production of micro/nanoscale patterns. One of the most challenging technical issues for thermal imprint lithography is the structural damages during demolding process. Thermal stress, adhesion force and friction force all play important roles in determination of the success of demolding and it is crucial to understand the underlying physics in order to optimize the structure and process design. In present study, …
A Novel Template Stage With Superior Alignment Capability For Nanoimprint And Step And Flash Lithography, Yunmi Jeon
A Novel Template Stage With Superior Alignment Capability For Nanoimprint And Step And Flash Lithography, Yunmi Jeon
LSU Master's Theses
The high-resolution capabilities of imprinting and step and flash lithography make these techniques strong contenders for the next generation lithography. Unfortunately, alignment remains an area of concern for nanoimprint because it must be completed before the template is moved into contact with the wafer. The large forces on the template during the process, even for step and flash, place additional demands on the stiffness as well as the reproducibility of the template stage. In this thesis, a prototype flexure stage has been developed to meet these demands. A compressive load, slightly below the Euler's limit, is used to produce relatively …