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Full-Text Articles in Engineering

Fabrication And Characterization Of Gated Silicon Field Emission Micro Triodes, Nanchou Liu Oct 1992

Fabrication And Characterization Of Gated Silicon Field Emission Micro Triodes, Nanchou Liu

Dissertations

This dissertation describes the fabrication technology and characterization of a gated silicon field emission micro triode that is a novel electron tunneling device for generating electron emission into a vacuum. Conic (point) and wedge field emitter structures with nm-scale radii were fabricated in silicon and GaAs by etching, MOCVD and dry oxidation. A new self-aligned process was developed for fabrication of vertical field emission triodes. This process allows control of gate opening to less than 0.5 μm diameter without the need of electron-beam writing. It also provides a planar gate electrode and a thick dielectric layer for reduction of the …


Performance Evaluation Of Spread Spectrum System With Cochannel Interference Through A Nonlinear Channel, Yong H. Kim May 1992

Performance Evaluation Of Spread Spectrum System With Cochannel Interference Through A Nonlinear Channel, Yong H. Kim

Dissertations

This thesis deals with the problem of more than one subscriber transmitting data signals through a common satellite repeater using code division multiplexing to separate the signals. We are concerned with the problem of amplifying two DS spread spectrum signals, both QPSK or BPSK modulated, in a common device in which limiting occurs. One signal is considered the signal we desire to receive, and the other, having the same nominal carrier frequency with a small random offset, is considered to be a cochannel interferer. The case of a cochannel interferer on the uplink and downlink in QPSK signalling and BPSK …


Process Technology And Characterization For Field Emission Devices, Jong Min Kim May 1992

Process Technology And Characterization For Field Emission Devices, Jong Min Kim

Dissertations

Vacuum microelectronics is a new research field which applies semiconductor process technology to the fabrication of micron-dimensioned electron devices. Vacuum microelectronics is made possible by advances in microstructures and nanofabrication technology. Vacuum microelectronic devices are further characterized by a wide operating temperature range, nuclear radiation immunity, higher emission current density potential, and lower power consumption than that of thermionic emitters. The low mass of the electron provides a higher carrier mobility than GaAs or any solid state device. These features offer the potentials for wide variety of applications.

In this dissertation. electron field emission structures applicable to a variety of …


Investigation Of Epitaxial Lift-Off Gaas And Langmuir-Blodgett Films For Optoelectronic Device Applications, Divyang M. Shah May 1992

Investigation Of Epitaxial Lift-Off Gaas And Langmuir-Blodgett Films For Optoelectronic Device Applications, Divyang M. Shah

Dissertations

Epitaxial lift-off (ELO), a technique of removing an epitaxially grown GaAs layer from its growth substrate by selective etching of an AlAs sacrificial layer, is described for field-effect transistor fabrication independent of the GaAs growth substrate. Metal Semiconductor Field-Effect Transistors (MESFETs) and High Electron Mobility Transistors (HEMTs) fabricated on silicon and sapphire substrates using ELO are investigated. A 0.1 μm gate length depletion mode MESFET made on silicon exhibited a unity current gain frequency ft = 34 GHz. Excellent device isolation with subpicoampere leakage currents is obtained. A high input impedance amplifier has been implemented on silicon substrate using …