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Full-Text Articles in Engineering
Electrical Properties Of Hydrogenated Diamond, Sacharia Albin, Linwood Watkins
Electrical Properties Of Hydrogenated Diamond, Sacharia Albin, Linwood Watkins
Electrical & Computer Engineering Faculty Publications
Hydrogen passivation of deep traps in diamond is demonstrated. Current‐voltage (I‐V) characteristics of polycrystalline thin film and bulk diamond were studied before and after hydrogenation. On hydrogenation, all the samples showed several orders of magnitude increase in conductivity. Hydrogenation was carried out under controlled conditions to study the changes in the I‐V characteristics of the samples. The concentration of uncompensated traps was varied systematically by hydrogenation. The concentration of electrically active hydrogen was determined from the I‐V data. It is shown that hydrogenation is an alternative to deep‐level transient spectroscopy, suitable for …
Raman Scattering Characterization Of The Microscopic Structure Of Semi-Insulating Polycrystalline Si Thin Films, D.J. Olego, H. Baumgart
Raman Scattering Characterization Of The Microscopic Structure Of Semi-Insulating Polycrystalline Si Thin Films, D.J. Olego, H. Baumgart
Electrical & Computer Engineering Faculty Publications
Raman scattering experiments were carried out to study the microscopic structure of semi-insulating polycrystalline Si (SIPOS) thin films prepared by low-pressure chemical vapor deposition. The samples contain 18, 25, and 30 at. % of oxygen and after growth they were annealed at 900 and 1000°C for 30 min. The Raman spectra show in the vibrational region of the optical frequencies of Si two bands, which arise from scattering in crystalline grains and disordered forms of Si. The behavior of these bands as a function of oxygen content and annealing temperatures was established in detail. The crystallinelike band peaks below the …
Strains In Si-Onsio2 Structures Formed By Oxygen Implantation: Raman Scattering Characterization, D.J. Olego, H. Baumgart, G.K. Celler
Strains In Si-Onsio2 Structures Formed By Oxygen Implantation: Raman Scattering Characterization, D.J. Olego, H. Baumgart, G.K. Celler
Electrical & Computer Engineering Faculty Publications
Low-temperature Raman scattering measurements were carried out to characterize Si-on-SiO2 structures formed by oxygen implantation and subsequent furnace or lamp annealing. The experiments were conducted with 413.1 nm laser light to probe only the thin Si layers at the top of the structures. The Raman spectra of the furnace-annealed samples are red shifted and broadened when compared with a virgin Si surface. The shifts and broadenings decrease with increasing annealing temperatures but they are still present in samples annealed above 1250°C for 3 h. No shifts or broadenings affect the Raman peaks of the layers, which were lamp annealed …
Slip Dislocation Formation During Continuous Wave Laser Annealing Of Silicon, Helmut Baumgart
Slip Dislocation Formation During Continuous Wave Laser Annealing Of Silicon, Helmut Baumgart
Electrical & Computer Engineering Faculty Publications
High-voltage electron microscopy (HVEM) has been used for the investigation of the defect structure in cw laser-annealed silicon. We report for the first time a (HVEM) analysis of the formation processes involved in the nucleation and glide of slip dislocations during epitaxial regrowth by cw laser annealing of ion-implantation damaged silicon layers. Based on the combined optical and HVEM observations a model of the dislocation generation and glide processes is presented.
Luminescence In Slipped And Dislocation-Free Laser-Annealed Silicon, R.H. Uebbing, P. Wagner, H. Baumgart, H. J. Queisser
Luminescence In Slipped And Dislocation-Free Laser-Annealed Silicon, R.H. Uebbing, P. Wagner, H. Baumgart, H. J. Queisser
Electrical & Computer Engineering Faculty Publications
Photoluminescence of cw laser-annealed silicon shows a dramatic difference in electronic behavior of the reconstructed material depending upon either creation or suppression of dislocations. Beyond a critical exposure time slip appears, and the luminescence of these samples is dominated by dislocation-related defect levels.