Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 2 of 2
Full-Text Articles in Engineering
Mems Fabrication Process Base On Su-8 Masking Layers, Scott A. Ostrow, Ronald A. Coutu Jr.
Mems Fabrication Process Base On Su-8 Masking Layers, Scott A. Ostrow, Ronald A. Coutu Jr.
AFIT Patents
A novel fabrication process uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices. This technique allows the use of positive photomasks with negative resists, opening the door to an ability to create complementary mechanical structures without the fabrication delays and costs associated with having to obtain a negative photomask. In addition, whereas an SU-8 mask would normally be left in place after processing, a technique utilizing a positive photoresist as a release layer has been developed so that the SU-8 masking material can …
Digitally Programmable Rf Mems Filters With Mechanically Coupled Resonators, Hengky Chandrahalim, Sunil Ashok Bhave
Digitally Programmable Rf Mems Filters With Mechanically Coupled Resonators, Hengky Chandrahalim, Sunil Ashok Bhave
AFIT Patents
A digitally-tunable RF MEMS filter includes a substrate and a plurality of mechanically coupled resonators, wherein a first and a last resonator of the plurality of mechanically coupled resonators are configured to be electrostatically transduced. One or more of the plurality of mechanically coupled resonators are configured to be biased relative to the substrate such that the one or more biased resonators may be brought substantially in contact with the substrate. In a method of digitally tuning an RF MEMS filter having a mechanically coupled resonator array, a DC bias voltage is applied to at least a first resonator and …